JPS5718334B2 - - Google Patents

Info

Publication number
JPS5718334B2
JPS5718334B2 JP9328476A JP9328476A JPS5718334B2 JP S5718334 B2 JPS5718334 B2 JP S5718334B2 JP 9328476 A JP9328476 A JP 9328476A JP 9328476 A JP9328476 A JP 9328476A JP S5718334 B2 JPS5718334 B2 JP S5718334B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP9328476A
Other languages
Japanese (ja)
Other versions
JPS5235534A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5235534A publication Critical patent/JPS5235534A/ja
Publication of JPS5718334B2 publication Critical patent/JPS5718334B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
    • C23F4/00—Processes for removing metallic material from surfaces, not provided for in group C23F1/00 or C23F3/00
    • G—PHYSICS
    • G11—INFORMATION STORAGE
    • G11C—STATIC STORES
    • G11C19/00—Digital stores in which the information is moved stepwise, e.g. shift registers
    • G11C19/02—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements
    • G11C19/08—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure
    • G11C19/0808—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation
    • G11C19/0825—Digital stores in which the information is moved stepwise, e.g. shift registers using magnetic elements using thin films in plane structure using magnetic domain propagation using a variable perpendicular magnetic field
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating, or etching for evaporating or etching for microworking, e. g. etching of gratings or trimming of electrical components
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24479—Structurally defined web or sheet [e.g., overall dimension, etc.] including variation in thickness
    • Y10T428/2457—Parallel ribs and/or grooves

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physics & Mathematics (AREA)
  • Plasma & Fusion (AREA)
  • Analytical Chemistry (AREA)
  • Thin Magnetic Films (AREA)
JP51093284A 1975-09-11 1976-08-06 Method of forming saw tooth wavy surface topography Granted JPS5235534A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US05/612,382 US4016062A (en) 1975-09-11 1975-09-11 Method of forming a serrated surface topography

Publications (2)

Publication Number Publication Date
JPS5235534A JPS5235534A (en) 1977-03-18
JPS5718334B2 true JPS5718334B2 (OSRAM) 1982-04-16

Family

ID=24452921

Family Applications (1)

Application Number Title Priority Date Filing Date
JP51093284A Granted JPS5235534A (en) 1975-09-11 1976-08-06 Method of forming saw tooth wavy surface topography

Country Status (4)

Country Link
US (1) US4016062A (OSRAM)
JP (1) JPS5235534A (OSRAM)
FR (1) FR2323490A1 (OSRAM)
GB (1) GB1543250A (OSRAM)

Families Citing this family (12)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5275341A (en) * 1975-12-19 1977-06-24 Rikagaku Kenkyusho Method of producing echelette grating
US4214966A (en) * 1979-03-20 1980-07-29 Bell Telephone Laboratories, Incorporated Process useful in the fabrication of articles with metallized surfaces
US4278493A (en) * 1980-04-28 1981-07-14 International Business Machines Corporation Method for cleaning surfaces by ion milling
US4358356A (en) * 1981-04-13 1982-11-09 Intel Magnetics, Inc. Method for sloping insulative layer in bubble memory
NL8200532A (nl) * 1982-02-12 1983-09-01 Philips Nv Reactief ionen etsen van een voorwerp van ferriet.
US4869780A (en) * 1987-04-10 1989-09-26 Trw Inc. Ion milling method
CA2097388A1 (en) * 1992-07-16 1994-01-17 Susan Nord Bohlke Topographical selective patterns
US5656535A (en) * 1996-03-04 1997-08-12 Siemens Aktiengesellschaft Storage node process for deep trench-based DRAM
US6613498B1 (en) 1998-09-17 2003-09-02 Mems Optical Llc Modulated exposure mask and method of using a modulated exposure mask
US20050108869A1 (en) * 2003-05-16 2005-05-26 Shuen-Shing Hsiao Method for manufacturing teeth of linear step motors
KR100529632B1 (ko) * 2003-10-01 2005-11-17 동부아남반도체 주식회사 반도체 소자 및 그 제조 방법
GB2600911A (en) * 2020-09-14 2022-05-18 Univ Surrey Apparatus for assessing touch sensitivity

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3540019A (en) * 1968-03-04 1970-11-10 Bell Telephone Labor Inc Single wall domain device
US3860783A (en) * 1970-10-19 1975-01-14 Bell Telephone Labor Inc Ion etching through a pattern mask
DE2223123A1 (de) * 1972-05-12 1973-11-22 Philips Patentverwaltung Magnetische speicherschicht
CA1009607A (en) * 1972-11-29 1977-05-03 Heinz Dimigen Method of manufacturing etched structures in substrates by ion etching

Also Published As

Publication number Publication date
JPS5235534A (en) 1977-03-18
GB1543250A (en) 1979-03-28
FR2323490B1 (OSRAM) 1979-09-28
US4016062A (en) 1977-04-05
FR2323490A1 (fr) 1977-04-08

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