JPS57182864U - - Google Patents

Info

Publication number
JPS57182864U
JPS57182864U JP7050781U JP7050781U JPS57182864U JP S57182864 U JPS57182864 U JP S57182864U JP 7050781 U JP7050781 U JP 7050781U JP 7050781 U JP7050781 U JP 7050781U JP S57182864 U JPS57182864 U JP S57182864U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP7050781U
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP7050781U priority Critical patent/JPS57182864U/ja
Priority to EP82104325A priority patent/EP0066175B1/en
Priority to DE8282104325T priority patent/DE3266001D1/de
Publication of JPS57182864U publication Critical patent/JPS57182864U/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
    • H01J37/3171—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation for ion implantation
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/04—Arrangements of electrodes and associated parts for generating or controlling the discharge, e.g. electron-optical arrangement or ion-optical arrangement
    • H01J37/147—Arrangements for directing or deflecting the discharge along a desired path
    • H01J37/1472—Deflecting along given lines
    • H01J37/1474—Scanning means
    • H01J37/1475—Scanning means magnetic

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
JP7050781U 1981-05-18 1981-05-18 Pending JPS57182864U (ja)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP7050781U JPS57182864U (ja) 1981-05-18 1981-05-18
EP82104325A EP0066175B1 (en) 1981-05-18 1982-05-17 Ion implanter
DE8282104325T DE3266001D1 (de) 1981-05-18 1982-05-17 Ion implanter

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP7050781U JPS57182864U (ja) 1981-05-18 1981-05-18

Publications (1)

Publication Number Publication Date
JPS57182864U true JPS57182864U (ja) 1982-11-19

Family

ID=13433509

Family Applications (1)

Application Number Title Priority Date Filing Date
JP7050781U Pending JPS57182864U (ja) 1981-05-18 1981-05-18

Country Status (3)

Country Link
EP (1) EP0066175B1 (ja)
JP (1) JPS57182864U (ja)
DE (1) DE3266001D1 (ja)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5389793A (en) * 1983-08-15 1995-02-14 Applied Materials, Inc. Apparatus and methods for ion implantation
US4578589A (en) * 1983-08-15 1986-03-25 Applied Materials, Inc. Apparatus and methods for ion implantation
EP0135366B1 (en) * 1983-08-15 1990-11-07 Applied Materials, Inc. System and method for ion implantation
JPH06508235A (ja) * 1991-03-25 1994-09-14 コモンウエルス　サイエンティフィック　アンド　インダストリアル　リサーチ　オーガニゼイション アークソース用大粒子フィルター

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
FR2133315A5 (ja) * 1971-04-16 1972-11-24 Thomson Csf
GB2052146B (en) * 1979-06-04 1983-06-22 Varian Associates Unitary electromagnet for double deflection scanning of charged particle beam

Also Published As

Publication number Publication date
EP0066175B1 (en) 1985-09-04
EP0066175A1 (en) 1982-12-08
DE3266001D1 (de) 1985-10-10

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