JPS57170819A - Manufacture of structural boron material - Google Patents

Manufacture of structural boron material

Info

Publication number
JPS57170819A
JPS57170819A JP5736881A JP5736881A JPS57170819A JP S57170819 A JPS57170819 A JP S57170819A JP 5736881 A JP5736881 A JP 5736881A JP 5736881 A JP5736881 A JP 5736881A JP S57170819 A JPS57170819 A JP S57170819A
Authority
JP
Japan
Prior art keywords
substrate
coated
boron
manufacture
structural
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP5736881A
Other languages
Japanese (ja)
Other versions
JPS6013965B2 (en
Inventor
Shigeru Yoshida
Masaki Aoki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Panasonic Holdings Corp
Original Assignee
Matsushita Electric Industrial Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Matsushita Electric Industrial Co Ltd filed Critical Matsushita Electric Industrial Co Ltd
Priority to JP5736881A priority Critical patent/JPS6013965B2/en
Publication of JPS57170819A publication Critical patent/JPS57170819A/en
Publication of JPS6013965B2 publication Critical patent/JPS6013965B2/en
Expired legal-status Critical Current

Links

Landscapes

  • Chemical Vapour Deposition (AREA)
  • Diaphragms For Electromechanical Transducers (AREA)

Abstract

PURPOSE: To manufacture a structural boron material with superior mechanical properties in a high yield by coating Ni with Ta, Mo, Nb or W, further coating it with Cr, depositing boron on the resulting substrate by chemical vapor deposition, and dissolving and removing the substrate.
CONSTITUTION: Ni is coated with Ta, Mo, Nb or W in 5.0W30μm film thickness, and it is further coated with Cr in 0.1W2.0μm film thickness to form a substrate. On this substrate boron is deposited by a chemical vapor deposition method by infrared heating or other heating and reduction decomposition. The substrate is then dissolved in HCl or the like and removed. The Ni substrate is coated with Ta, Mo, Nb or W chiefly by sputtering, and when it is coated with Cr, vacuum deposition and plating can be also applied.
COPYRIGHT: (C)1982,JPO&Japio
JP5736881A 1981-04-15 1981-04-15 Manufacturing method of boron structural material Expired JPS6013965B2 (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP5736881A JPS6013965B2 (en) 1981-04-15 1981-04-15 Manufacturing method of boron structural material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP5736881A JPS6013965B2 (en) 1981-04-15 1981-04-15 Manufacturing method of boron structural material

Publications (2)

Publication Number Publication Date
JPS57170819A true JPS57170819A (en) 1982-10-21
JPS6013965B2 JPS6013965B2 (en) 1985-04-10

Family

ID=13053639

Family Applications (1)

Application Number Title Priority Date Filing Date
JP5736881A Expired JPS6013965B2 (en) 1981-04-15 1981-04-15 Manufacturing method of boron structural material

Country Status (1)

Country Link
JP (1) JPS6013965B2 (en)

Also Published As

Publication number Publication date
JPS6013965B2 (en) 1985-04-10

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