JPS57150943U - - Google Patents
Info
- Publication number
- JPS57150943U JPS57150943U JP3807081U JP3807081U JPS57150943U JP S57150943 U JPS57150943 U JP S57150943U JP 3807081 U JP3807081 U JP 3807081U JP 3807081 U JP3807081 U JP 3807081U JP S57150943 U JPS57150943 U JP S57150943U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3807081U JPS57150943U (ja) | 1981-03-18 | 1981-03-18 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3807081U JPS57150943U (ja) | 1981-03-18 | 1981-03-18 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS57150943U true JPS57150943U (ja) | 1982-09-22 |
Family
ID=29835239
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3807081U Pending JPS57150943U (ja) | 1981-03-18 | 1981-03-18 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57150943U (ja) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62173723A (ja) * | 1986-01-27 | 1987-07-30 | Nippon Telegr & Teleph Corp <Ntt> | プラズマ処理装置 |
| JPH02290973A (ja) * | 1989-04-28 | 1990-11-30 | Hitachi Ltd | 薄膜形成装置 |
| KR100346772B1 (ko) * | 1993-07-16 | 2002-12-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 반도체처리시웨이퍼와pvd타겟사이의거리를조절하는방법및장치 |
| JP2014531510A (ja) * | 2011-09-09 | 2014-11-27 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 誘電体材料の堆積速度および成長動態を高める多重周波数スパッタリング |
-
1981
- 1981-03-18 JP JP3807081U patent/JPS57150943U/ja active Pending
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS62173723A (ja) * | 1986-01-27 | 1987-07-30 | Nippon Telegr & Teleph Corp <Ntt> | プラズマ処理装置 |
| JPH02290973A (ja) * | 1989-04-28 | 1990-11-30 | Hitachi Ltd | 薄膜形成装置 |
| KR100346772B1 (ko) * | 1993-07-16 | 2002-12-05 | 어플라이드 머티어리얼스, 인코포레이티드 | 반도체처리시웨이퍼와pvd타겟사이의거리를조절하는방법및장치 |
| JP2014531510A (ja) * | 2011-09-09 | 2014-11-27 | アプライド マテリアルズ インコーポレイテッドＡｐｐｌｉｅｄ Ｍａｔｅｒｉａｌｓ，Ｉｎｃｏｒｐｏｒａｔｅｄ | 誘電体材料の堆積速度および成長動態を高める多重周波数スパッタリング |