JPS57141644A - Photographic element - Google Patents

Photographic element

Info

Publication number
JPS57141644A
JPS57141644A JP2799281A JP2799281A JPS57141644A JP S57141644 A JPS57141644 A JP S57141644A JP 2799281 A JP2799281 A JP 2799281A JP 2799281 A JP2799281 A JP 2799281A JP S57141644 A JPS57141644 A JP S57141644A
Authority
JP
Japan
Prior art keywords
polymer
photographic element
barrier layer
high molecular
layer made
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP2799281A
Other languages
Japanese (ja)
Other versions
JPH0133821B2 (en
Inventor
Mikio Kamiyama
Noboru Mizukura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Konica Minolta Inc
Original Assignee
Konica Minolta Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Konica Minolta Inc filed Critical Konica Minolta Inc
Priority to JP2799281A priority Critical patent/JPS57141644A/en
Priority to DE19823207000 priority patent/DE3207000A1/en
Publication of JPS57141644A publication Critical patent/JPS57141644A/en
Publication of JPH0133821B2 publication Critical patent/JPH0133821B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00—Photosensitive materials
    • G03C1/76—Photosensitive materials characterised by the base or auxiliary layers
    • G03C1/7614—Cover layers; Backing layers; Base or auxiliary layers characterised by means for lubricating, for rendering anti-abrasive or for preventing adhesion
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C8/00—Diffusion transfer processes or agents therefor; Photosensitive materials for such processes
    • G03C8/42—Structural details
    • G03C8/52—Bases or auxiliary layers; Substances therefor

Abstract

PURPOSE: To form a photographic element having alkali permeability almost independent of temp. and superior shelf stability by laying a temporary barrier layer made of specified high molecular polymer to an alkaline treating composition.
CONSTITUTION: A high molecular polymer having repeating units represented by formulaI(where R is H or methyl; L is a bivalent org. group; and A is a group contg. a 5- or 6-membered lactone deriv.), e.g., repeating units of formula II is used. The preferred polymer is a copolymer contg. about 25W95wt% monomer units having about 0.001×10-10W750×10-10 coefft. of moisture permeability in case of a homopolymer and about 0.5W44.5wt% monomer units of ethylenic unsatd. acid (salt), e.g., the copolymer of formula III. A temporary barrier layer made of said polymer is interposed between 2 alkali permeable layers of a photographic element to arbitrarily control the beginning of the working of various reagents such as a development inhibitor.
COPYRIGHT: (C)1982,JPO&Japio
JP2799281A 1981-02-26 1981-02-26 Photographic element Granted JPS57141644A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2799281A JPS57141644A (en) 1981-02-26 1981-02-26 Photographic element
DE19823207000 DE3207000A1 (en) 1981-02-26 1982-02-26 Photographic recording material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2799281A JPS57141644A (en) 1981-02-26 1981-02-26 Photographic element

Publications (2)

Publication Number Publication Date
JPS57141644A true JPS57141644A (en) 1982-09-02
JPH0133821B2 JPH0133821B2 (en) 1989-07-14

Family

ID=12236311

Family Applications (1)

Application Number Title Priority Date Filing Date
JP2799281A Granted JPS57141644A (en) 1981-02-26 1981-02-26 Photographic element

Country Status (2)

Country Link
JP (1) JPS57141644A (en)
DE (1) DE3207000A1 (en)

Cited By (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110710A (en) * 1983-10-26 1985-06-17 ユニオン、カーバイド、コーポレーシヨン Manufacture of high molecular composition
WO1999050322A1 (en) * 1998-03-27 1999-10-07 Mitsubishi Rayon Co., Ltd. Copolymer, process for producing the same, and resist composition
US6087063A (en) * 1997-06-27 2000-07-11 Tokyo Ohka Kogyo Co., Ltd. Positive-working photoresist composition
US6388101B1 (en) 1997-01-24 2002-05-14 Tokyo Ohka Kogyo Co., Ltd. Chemical-sensitization photoresist composition
WO2012043102A1 (en) * 2010-09-29 2012-04-05 株式会社クラレ Acrylamide derivative, polymer compound and photoresist composition
CN108427150A (en) * 2017-02-14 2018-08-21 株式会社凸版巴川光学薄膜 Optical film, polarizer and display unit using the optical film

Cited By (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS60110710A (en) * 1983-10-26 1985-06-17 ユニオン、カーバイド、コーポレーシヨン Manufacture of high molecular composition
US6388101B1 (en) 1997-01-24 2002-05-14 Tokyo Ohka Kogyo Co., Ltd. Chemical-sensitization photoresist composition
US6087063A (en) * 1997-06-27 2000-07-11 Tokyo Ohka Kogyo Co., Ltd. Positive-working photoresist composition
US6225476B1 (en) 1997-06-27 2001-05-01 Tokyo Ohka Kogyo Co., Ltd. Positive-working photoresist composition
WO1999050322A1 (en) * 1998-03-27 1999-10-07 Mitsubishi Rayon Co., Ltd. Copolymer, process for producing the same, and resist composition
US6706826B1 (en) 1998-03-27 2004-03-16 Mitsubishi Rayon Co., Ltd. Copolymer, process for producing the same, and resist composition
WO2012043102A1 (en) * 2010-09-29 2012-04-05 株式会社クラレ Acrylamide derivative, polymer compound and photoresist composition
JP6018504B2 (en) * 2010-09-29 2016-11-02 株式会社クラレ Acrylamide derivatives, polymer compounds and photoresist compositions
CN108427150A (en) * 2017-02-14 2018-08-21 株式会社凸版巴川光学薄膜 Optical film, polarizer and display unit using the optical film
CN108427150B (en) * 2017-02-14 2019-07-09 株式会社凸版巴川光学薄膜 Optical film, polarizer and display unit using the optical film

Also Published As

Publication number Publication date
JPH0133821B2 (en) 1989-07-14
DE3207000A1 (en) 1982-09-16

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