JPS57134560A - Ion source device - Google Patents

Ion source device

Info

Publication number
JPS57134560A
JPS57134560A JP1951581A JP1951581A JPS57134560A JP S57134560 A JPS57134560 A JP S57134560A JP 1951581 A JP1951581 A JP 1951581A JP 1951581 A JP1951581 A JP 1951581A JP S57134560 A JPS57134560 A JP S57134560A
Authority
JP
Japan
Prior art keywords
electrode
ion source
source device
needlelike
support members
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP1951581A
Other languages
Japanese (ja)
Inventor
Masanori Komuro
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
National Institute of Advanced Industrial Science and Technology AIST
Original Assignee
Agency of Industrial Science and Technology
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Agency of Industrial Science and Technology filed Critical Agency of Industrial Science and Technology
Priority to JP1951581A priority Critical patent/JPS57134560A/en
Publication of JPS57134560A publication Critical patent/JPS57134560A/en
Pending legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/24—Vacuum evaporation
    • C23C14/32—Vacuum evaporation by explosion; by evaporation and subsequent ionisation of the vapours, e.g. ion-plating

Landscapes

  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Physical Vapour Deposition (AREA)
  • Electron Sources, Ion Sources (AREA)
  • Electron Beam Exposure (AREA)

Abstract

PURPOSE:To make mass production of ion source devices possible and to stabilize the performance thereof in an electric field evaporation type ion source device using a hairpin type heater by providing a material sticking structure and needlelike electrode support members near a needlelike electrode. CONSTITUTION:Needlelike electrode support members 7 are fitted on an insulation substrate 3 of an ion source device, and a needlelike electrode 1 and a spiral heater 2 are fixed thereto independently. In this case, the electrode 1 can be fixed easily in a vertical direction in the central position of the substrate 3. If a soft material such as Ta or Mo is used, the position and direction of the electrode 1 can be finely adjusted after fixing of the electrode 1. On the other hand, the curved part shape of a hairpin type heater is made spiral as shown by 6, and is made into the material sticking structure that surrounds the electrode 1, whereby a material 4 to be ionized is stuck in a large amt. thereon and the life of the ion source device is prolonged.
JP1951581A 1981-02-12 1981-02-12 Ion source device Pending JPS57134560A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP1951581A JPS57134560A (en) 1981-02-12 1981-02-12 Ion source device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP1951581A JPS57134560A (en) 1981-02-12 1981-02-12 Ion source device

Publications (1)

Publication Number Publication Date
JPS57134560A true JPS57134560A (en) 1982-08-19

Family

ID=12001486

Family Applications (1)

Application Number Title Priority Date Filing Date
JP1951581A Pending JPS57134560A (en) 1981-02-12 1981-02-12 Ion source device

Country Status (1)

Country Link
JP (1) JPS57134560A (en)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS583579A (en) * 1981-06-25 1983-01-10 Mitsubishi Electric Corp Transistor inverter

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS583579A (en) * 1981-06-25 1983-01-10 Mitsubishi Electric Corp Transistor inverter

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