JPS5713137B2 - - Google Patents
Info
- Publication number
- JPS5713137B2 JPS5713137B2 JP4531979A JP4531979A JPS5713137B2 JP S5713137 B2 JPS5713137 B2 JP S5713137B2 JP 4531979 A JP4531979 A JP 4531979A JP 4531979 A JP4531979 A JP 4531979A JP S5713137 B2 JPS5713137 B2 JP S5713137B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having at least one potential-jump barrier or surface barrier, e.g. PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic System or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4531979A JPS55138834A (en) | 1979-04-16 | 1979-04-16 | Dry etching method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4531979A JPS55138834A (en) | 1979-04-16 | 1979-04-16 | Dry etching method |
Related Child Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP20598182A Division JPS58100684A (en) | 1982-11-26 | 1982-11-26 | Dry etching method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS55138834A JPS55138834A (en) | 1980-10-30 |
| JPS5713137B2 true JPS5713137B2 (en) | 1982-03-15 |
Family
ID=12715976
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4531979A Granted JPS55138834A (en) | 1979-04-16 | 1979-04-16 | Dry etching method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS55138834A (en) |
Families Citing this family (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| EP0380667A4 (en) * | 1987-10-07 | 1991-04-24 | Terumo Kabushiki Kaisha | Ultraviolet-absorbing polymer material and photoetching process |
| JP3559691B2 (en) * | 1997-09-04 | 2004-09-02 | 株式会社日立製作所 | Method for manufacturing semiconductor device |
| US11164751B2 (en) | 2017-06-08 | 2021-11-02 | Showa Denko K.K. | Etching method |
-
1979
- 1979-04-16 JP JP4531979A patent/JPS55138834A/en active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS55138834A (en) | 1980-10-30 |