JPS57130426A - Exposure by electron rays - Google Patents
Exposure by electron raysInfo
- Publication number
- JPS57130426A JPS57130426A JP1620481A JP1620481A JPS57130426A JP S57130426 A JPS57130426 A JP S57130426A JP 1620481 A JP1620481 A JP 1620481A JP 1620481 A JP1620481 A JP 1620481A JP S57130426 A JPS57130426 A JP S57130426A
- Authority
- JP
- Japan
- Prior art keywords
- ridge
- controller
- memory
- point
- cpu1
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 239000011159 matrix material Substances 0.000 abstract 4
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/302—Controlling tubes by external information, e.g. programme control
- H01J37/3023—Programme control
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1620481A JPS57130426A (en) | 1981-02-05 | 1981-02-05 | Exposure by electron rays |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1620481A JPS57130426A (en) | 1981-02-05 | 1981-02-05 | Exposure by electron rays |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS57130426A true JPS57130426A (en) | 1982-08-12 |
| JPS6250053B2 JPS6250053B2 (enrdf_load_stackoverflow) | 1987-10-22 |
Family
ID=11909975
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1620481A Granted JPS57130426A (en) | 1981-02-05 | 1981-02-05 | Exposure by electron rays |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS57130426A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63199422A (ja) * | 1987-02-16 | 1988-08-17 | Toshiba Corp | 荷電ビ−ム描画方法 |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6347851U (enrdf_load_stackoverflow) * | 1986-09-16 | 1988-03-31 |
-
1981
- 1981-02-05 JP JP1620481A patent/JPS57130426A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63199422A (ja) * | 1987-02-16 | 1988-08-17 | Toshiba Corp | 荷電ビ−ム描画方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6250053B2 (enrdf_load_stackoverflow) | 1987-10-22 |
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