JPS57114139A - Photopolymerizing composition - Google Patents

Photopolymerizing composition

Info

Publication number
JPS57114139A
JPS57114139A JP66081A JP66081A JPS57114139A JP S57114139 A JPS57114139 A JP S57114139A JP 66081 A JP66081 A JP 66081A JP 66081 A JP66081 A JP 66081A JP S57114139 A JPS57114139 A JP S57114139A
Authority
JP
Japan
Prior art keywords
compound
composition
dye
represented
halogen
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP66081A
Other languages
Japanese (ja)
Inventor
Kazuo Kitamura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Toray Industries Inc
Original Assignee
Toray Industries Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Toray Industries Inc filed Critical Toray Industries Inc
Priority to JP66081A priority Critical patent/JPS57114139A/en
Publication of JPS57114139A publication Critical patent/JPS57114139A/en
Pending legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029

Landscapes

  • Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)

Abstract

PURPOSE:To obtain the titled inexpensive composition having remarkably high sensitivity to visible light by adding a photopolymn. initiator made of specified dye compound and a compound contg. a specified unsatd. group. CONSTITUTION:This photopolymerizing composition consists of a compound used as a dye in general and represented by formulaI[where M1 is H or an alkali metal; M2 is H, an alkali metal or (substituted) ammonium; each of X1-X8 is halogen, H, a univalent org. or inorg. residue; and one or more among them are halogen], e.g., eosine or erythrosine and of a compound contg. >=1 unsatd. group represented by formula II (where R is H or methyl), e.g., a compound represented by formula III (where R is H or methyl; and each of R' and R'' is a bivalent org. residue). Since this composition has remarkably high sensitivity to visible light, and it has been colored with the sensitizing dye, a clear visible image is obtd. This image has high ink receptivity, oxidation resistance, etc. and is suitably used as a printing plate or a resist.
JP66081A 1981-01-08 1981-01-08 Photopolymerizing composition Pending JPS57114139A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP66081A JPS57114139A (en) 1981-01-08 1981-01-08 Photopolymerizing composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP66081A JPS57114139A (en) 1981-01-08 1981-01-08 Photopolymerizing composition

Publications (1)

Publication Number Publication Date
JPS57114139A true JPS57114139A (en) 1982-07-15

Family

ID=11479872

Family Applications (1)

Application Number Title Priority Date Filing Date
JP66081A Pending JPS57114139A (en) 1981-01-08 1981-01-08 Photopolymerizing composition

Country Status (1)

Country Link
JP (1) JPS57114139A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0211615A2 (en) * 1985-08-01 1987-02-25 Nippon Paint Co., Ltd. Photopolymerisable composition

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926079A (en) * 1972-06-30 1974-03-08
JPS5559457A (en) * 1978-10-25 1980-05-02 Fuji Photo Film Co Ltd Image formation method capable of correcting exposed area
JPS5579438A (en) * 1978-12-13 1980-06-14 Toray Ind Inc Photosensitive polyamide resin composition

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4926079A (en) * 1972-06-30 1974-03-08
JPS5559457A (en) * 1978-10-25 1980-05-02 Fuji Photo Film Co Ltd Image formation method capable of correcting exposed area
JPS5579438A (en) * 1978-12-13 1980-06-14 Toray Ind Inc Photosensitive polyamide resin composition

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
EP0211615A2 (en) * 1985-08-01 1987-02-25 Nippon Paint Co., Ltd. Photopolymerisable composition

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