JPS5711342A - Photographic sensitive material - Google Patents
Photographic sensitive materialInfo
- Publication number
- JPS5711342A JPS5711342A JP8620180A JP8620180A JPS5711342A JP S5711342 A JPS5711342 A JP S5711342A JP 8620180 A JP8620180 A JP 8620180A JP 8620180 A JP8620180 A JP 8620180A JP S5711342 A JPS5711342 A JP S5711342A
- Authority
- JP
- Japan
- Prior art keywords
- sensitive material
- layer
- alkyl
- contg
- polymer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/04—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with macromolecular additives; with layer-forming substances
- G03C1/053—Polymers obtained by reactions involving only carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08F—MACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
- C08F12/00—Homopolymers and copolymers of compounds having one or more unsaturated aliphatic radicals, each having only one carbon-to-carbon double bond, and at least one being terminated by an aromatic carbocyclic ring
- C08F12/02—Monomers containing only one unsaturated aliphatic radical
- C08F12/04—Monomers containing only one unsaturated aliphatic radical containing one ring
- C08F12/14—Monomers containing only one unsaturated aliphatic radical containing one ring substituted by hetero atoms or groups containing heteroatoms
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03C—PHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
- G03C1/00—Photosensitive materials
- G03C1/005—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein
- G03C1/06—Silver halide emulsions; Preparation thereof; Physical treatment thereof; Incorporation of additives therein with non-macromolecular additives
- G03C1/38—Dispersants; Agents facilitating spreading
- G03C1/385—Dispersants; Agents facilitating spreading containing fluorine
Abstract
PURPOSE: To provide antistatic properties to a photographic sensitive material without deteriorating the photographic characteristics and to enhance the abrasion resistance, etc. of the material by adding a polymer contg. a styrene monomer having an F-contg. substituent in each polymerizing unit to ≥1 layers of the sensitive material, especially to the surface protective layer, the back layer, etc.
CONSTITUTION: To a layer of a sensitive material, especially to the outermost layer is added a polymer, as an antistatic agent, represented by the formula [where A is an ethylenic unsatd. copolymerizable monomeric unit, R1 is H, halogen or 1W3C alkyl, R2 is a monovalent substituent, Rf is 1W30C alkyl with F substituted for ≥1 H atoms, such aryl or the like, X is a divalent combining group represented by -(R)p-L-, R is alkylene, arylene or the like, L is OH, imino, carboxy, sulfone or the like, p is 0 or 1, l is 0W4, m is 0W3, n is 1W5, x is 1W100mol% and y is 0W 99mol%]. Thus, a sensitive material with high film strength and low adhesion to other surface is obtd. The material undergoes no change in the electrostatic characteristics with the passage of time after manufacture.
COPYRIGHT: (C)1982,JPO&Japio
Priority Applications (6)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8620180A JPS5711342A (en) | 1980-06-25 | 1980-06-25 | Photographic sensitive material |
GB8119475A GB2080559B (en) | 1980-06-25 | 1981-06-24 | Silver halide photographic materials |
GB8119474A GB2079964B (en) | 1980-06-25 | 1981-06-24 | Silver halide photographic materials |
US06/277,370 US4495275A (en) | 1980-06-25 | 1981-06-25 | Silver halide photographic materials |
DE19813125026 DE3125026A1 (en) | 1980-06-25 | 1981-06-25 | PHOTOGRAPHIC SILVER HALOGENIDE MATERIALS |
DE19813125025 DE3125025A1 (en) | 1980-06-25 | 1981-06-25 | PHOTOGRAPHIC SILVER HALOGENIDE MATERIALS |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8620180A JPS5711342A (en) | 1980-06-25 | 1980-06-25 | Photographic sensitive material |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5711342A true JPS5711342A (en) | 1982-01-21 |
JPS6116056B2 JPS6116056B2 (en) | 1986-04-28 |
Family
ID=13880159
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8620180A Granted JPS5711342A (en) | 1980-06-25 | 1980-06-25 | Photographic sensitive material |
Country Status (3)
Country | Link |
---|---|
JP (1) | JPS5711342A (en) |
DE (1) | DE3125026A1 (en) |
GB (1) | GB2079964B (en) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6114632A (en) * | 1984-06-29 | 1986-01-22 | Konishiroku Photo Ind Co Ltd | Photosensitive material |
JPS61201347U (en) * | 1985-06-07 | 1986-12-17 | ||
JPS61201346U (en) * | 1985-06-07 | 1986-12-17 | ||
JPH0196650A (en) * | 1987-10-08 | 1989-04-14 | Fuji Photo Film Co Ltd | Image forming sheet |
WO2009087981A1 (en) * | 2008-01-11 | 2009-07-16 | Kri Inc. | Polymerizable compound and method for producing the same |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS63124839U (en) * | 1987-02-10 | 1988-08-15 |
Family Cites Families (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
FR1402022A (en) * | 1964-04-27 | 1965-06-11 | Kodak Pathe | New anti-static photographic films |
-
1980
- 1980-06-25 JP JP8620180A patent/JPS5711342A/en active Granted
-
1981
- 1981-06-24 GB GB8119474A patent/GB2079964B/en not_active Expired
- 1981-06-25 DE DE19813125026 patent/DE3125026A1/en not_active Ceased
Cited By (6)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS6114632A (en) * | 1984-06-29 | 1986-01-22 | Konishiroku Photo Ind Co Ltd | Photosensitive material |
JPH0411014B2 (en) * | 1984-06-29 | 1992-02-27 | ||
JPS61201347U (en) * | 1985-06-07 | 1986-12-17 | ||
JPS61201346U (en) * | 1985-06-07 | 1986-12-17 | ||
JPH0196650A (en) * | 1987-10-08 | 1989-04-14 | Fuji Photo Film Co Ltd | Image forming sheet |
WO2009087981A1 (en) * | 2008-01-11 | 2009-07-16 | Kri Inc. | Polymerizable compound and method for producing the same |
Also Published As
Publication number | Publication date |
---|---|
JPS6116056B2 (en) | 1986-04-28 |
GB2079964B (en) | 1983-10-26 |
DE3125026A1 (en) | 1982-03-25 |
GB2079964A (en) | 1982-01-27 |
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