JPS57106808A - Oscillator system film thickness meter - Google Patents
Oscillator system film thickness meterInfo
- Publication number
- JPS57106808A JPS57106808A JP18343480A JP18343480A JPS57106808A JP S57106808 A JPS57106808 A JP S57106808A JP 18343480 A JP18343480 A JP 18343480A JP 18343480 A JP18343480 A JP 18343480A JP S57106808 A JPS57106808 A JP S57106808A
- Authority
- JP
- Japan
- Prior art keywords
- oscillator
- film
- frequency
- thickness
- measuring
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 239000010453 quartz Substances 0.000 abstract 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N silicon dioxide Inorganic materials O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 abstract 4
- 238000007740 vapor deposition Methods 0.000 abstract 3
Classifications
-
- G—PHYSICS
- G01—MEASURING; TESTING
- G01B—MEASURING LENGTH, THICKNESS OR SIMILAR LINEAR DIMENSIONS; MEASURING ANGLES; MEASURING AREAS; MEASURING IRREGULARITIES OF SURFACES OR CONTOURS
- G01B7/00—Measuring arrangements characterised by the use of electric or magnetic techniques
- G01B7/02—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness
- G01B7/06—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness
- G01B7/063—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators
- G01B7/066—Measuring arrangements characterised by the use of electric or magnetic techniques for measuring length, width or thickness for measuring thickness using piezoelectric resonators for measuring thickness of coating
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Length Measuring Devices Characterised By Use Of Acoustic Means (AREA)
Abstract
PURPOSE:To measure the thickness of a film with high precision eliminating measuring errors owing to a temperature fluctuation by using an oscillator for measuring the thickness of a film by vapor deposition and an oscillator for compensating temperature. CONSTITUTION:The thickness of a film by vapor deposition is measured by measuring in the heterodyne system the difference in the frequency of two quartz oscillator X1 and X0 connecting a quartz oscillator for measuring the thickness of a film by vapor deposition X1 and an oscillator for compensating temperature X0 to a mixer. When the frequency f1 of the quartz oscillator X1 and the frequency f0 of the quartz oscillator X0 are mixed by the mixer, two frequencies of f0+f1 and f0-f1 come out as an output, out of which only the frequency f0-f1 is taken out as the output.
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18343480A JPS57106808A (en) | 1980-12-24 | 1980-12-24 | Oscillator system film thickness meter |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP18343480A JPS57106808A (en) | 1980-12-24 | 1980-12-24 | Oscillator system film thickness meter |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS57106808A true JPS57106808A (en) | 1982-07-02 |
Family
ID=16135700
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP18343480A Pending JPS57106808A (en) | 1980-12-24 | 1980-12-24 | Oscillator system film thickness meter |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS57106808A (en) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2014116791A (en) * | 2012-12-10 | 2014-06-26 | Nippon Dempa Kogyo Co Ltd | Oscillation device |
US20150176129A1 (en) * | 2010-11-04 | 2015-06-25 | Canon Kabushiki Kaisha | Film formation apparatus and film formation method |
-
1980
- 1980-12-24 JP JP18343480A patent/JPS57106808A/en active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US20150176129A1 (en) * | 2010-11-04 | 2015-06-25 | Canon Kabushiki Kaisha | Film formation apparatus and film formation method |
US9382624B2 (en) * | 2010-11-04 | 2016-07-05 | Canon Kabushiki Kaisha | Film formation method using oscillators for measurement and calibration during calibration step performed during film formation |
JP2014116791A (en) * | 2012-12-10 | 2014-06-26 | Nippon Dempa Kogyo Co Ltd | Oscillation device |
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