JPS57101835A - Thermodevelopable photosensitive material - Google Patents

Thermodevelopable photosensitive material

Info

Publication number
JPS57101835A
JPS57101835A JP17821480A JP17821480A JPS57101835A JP S57101835 A JPS57101835 A JP S57101835A JP 17821480 A JP17821480 A JP 17821480A JP 17821480 A JP17821480 A JP 17821480A JP S57101835 A JPS57101835 A JP S57101835A
Authority
JP
Japan
Prior art keywords
organic acid
silver salt
reductant
acid silver
antihalation layer
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17821480A
Other languages
English (en)
Inventor
Tomomasa Usami
Yasushi Nozawa
Ken Kawada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fujifilm Holdings Corp
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Priority to JP17821480A priority Critical patent/JPS57101835A/ja
Publication of JPS57101835A publication Critical patent/JPS57101835A/ja
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03CPHOTOSENSITIVE MATERIALS FOR PHOTOGRAPHIC PURPOSES; PHOTOGRAPHIC PROCESSES, e.g. CINE, X-RAY, COLOUR, STEREO-PHOTOGRAPHIC PROCESSES; AUXILIARY PROCESSES IN PHOTOGRAPHY
    • G03C1/00Photosensitive materials
    • G03C1/494Silver salt compositions other than silver halide emulsions; Photothermographic systems ; Thermographic systems using noble metal compounds
    • G03C1/498Photothermographic systems, e.g. dry silver
    • G03C1/49836Additives
    • G03C1/49845Active additives, e.g. toners, stabilisers, sensitisers
    • G03C1/49854Dyes or precursors of dyes

Landscapes

  • Chemical & Material Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Materials Engineering (AREA)
  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Non-Silver Salt Photosensitive Materials And Non-Silver Salt Photography (AREA)
JP17821480A 1980-12-17 1980-12-17 Thermodevelopable photosensitive material Pending JPS57101835A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17821480A JPS57101835A (en) 1980-12-17 1980-12-17 Thermodevelopable photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17821480A JPS57101835A (en) 1980-12-17 1980-12-17 Thermodevelopable photosensitive material

Publications (1)

Publication Number Publication Date
JPS57101835A true JPS57101835A (en) 1982-06-24

Family

ID=16044572

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17821480A Pending JPS57101835A (en) 1980-12-17 1980-12-17 Thermodevelopable photosensitive material

Country Status (1)

Country Link
JP (1) JPS57101835A (ja)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5312721A (en) * 1991-12-24 1994-05-17 E. I. Du Pont De Nemours And Company Bleachable antihalation system
JP2016514705A (ja) * 2013-03-15 2016-05-23 アジエリス ファーマシューティカル テクノロジーズ コンパニー リミテッド ニトロキソリンの塩基付加塩及びその使用

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5312721A (en) * 1991-12-24 1994-05-17 E. I. Du Pont De Nemours And Company Bleachable antihalation system
JP2016514705A (ja) * 2013-03-15 2016-05-23 アジエリス ファーマシューティカル テクノロジーズ コンパニー リミテッド ニトロキソリンの塩基付加塩及びその使用
US9758484B2 (en) 2013-03-15 2017-09-12 Asieris Pharmaceutical Technologies Co., Ltd. Base addition salts of nitroxoline and uses thereof

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