JPS57101689A - Electroplating method - Google Patents

Electroplating method

Info

Publication number
JPS57101689A
JPS57101689A JP17843180A JP17843180A JPS57101689A JP S57101689 A JPS57101689 A JP S57101689A JP 17843180 A JP17843180 A JP 17843180A JP 17843180 A JP17843180 A JP 17843180A JP S57101689 A JPS57101689 A JP S57101689A
Authority
JP
Japan
Prior art keywords
anode
electrode plate
soluble
adjusted
area ratio
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP17843180A
Other languages
Japanese (ja)
Inventor
Teruo Suzuki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Seiko Instruments Inc
Original Assignee
Seiko Instruments Inc
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Seiko Instruments Inc filed Critical Seiko Instruments Inc
Priority to JP17843180A priority Critical patent/JPS57101689A/en
Publication of JPS57101689A publication Critical patent/JPS57101689A/en
Pending legal-status Critical Current

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  • Electroplating Methods And Accessories (AREA)

Abstract

PURPOSE: To obtain good plating by a method wherein, in strong acidic plating bath, a soluble and an insoluble electrode plates are simultaneously used as an anode while an area ratio therebetween is adjusted to keep a pH during electrolysis constant.
CONSTITUTION: When a soluble electrode plate is used as an anode in a strong acidic plating bath, pH is raised and, reversely, when an insoluble electrode plate is used as the anode, the pH is lowered rapidly. Then, both electrodes are used together as well as, in due consideration of anode current efficiency of the soluble electrode plate, an area ratio of both electrode plates is adjusted. For example, in a plating liquid comprising cobalt sulfate, ferrous sulfate, sodium boron fluoride, sodium saccharine, the area ratio of the soluble electrode plate (Co) and the insoluble electrode plate (C) in the anode is adjusted to about 1:1.2. Further, when electroplating is carried out under such a condition that a ratio of anode: cathode is about 1:1 and pH is about 2.0, pH is held at about 2.02 and is scarcely changed.
COPYRIGHT: (C)1982,JPO&Japio
JP17843180A 1980-12-17 1980-12-17 Electroplating method Pending JPS57101689A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP17843180A JPS57101689A (en) 1980-12-17 1980-12-17 Electroplating method

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP17843180A JPS57101689A (en) 1980-12-17 1980-12-17 Electroplating method

Publications (1)

Publication Number Publication Date
JPS57101689A true JPS57101689A (en) 1982-06-24

Family

ID=16048384

Family Applications (1)

Application Number Title Priority Date Filing Date
JP17843180A Pending JPS57101689A (en) 1980-12-17 1980-12-17 Electroplating method

Country Status (1)

Country Link
JP (1) JPS57101689A (en)

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