JPS569747A - Producing reticules - Google Patents
Producing reticulesInfo
- Publication number
- JPS569747A JPS569747A JP6078180A JP6078180A JPS569747A JP S569747 A JPS569747 A JP S569747A JP 6078180 A JP6078180 A JP 6078180A JP 6078180 A JP6078180 A JP 6078180A JP S569747 A JPS569747 A JP S569747A
- Authority
- JP
- Japan
- Prior art keywords
- reticules
- producing
- producing reticules
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/26—Processing photosensitive materials; Apparatus therefor
- G03F7/42—Stripping or agents therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/16—Coating processes; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
FR7917304A FR2460496A1 (fr) | 1979-06-29 | 1979-06-29 | Procede pour fabriquer des reticules sur plaques chromees direc tement par un generateur d'images |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS569747A true JPS569747A (en) | 1981-01-31 |
JPS6154212B2 JPS6154212B2 (ja) | 1986-11-21 |
Family
ID=9227473
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP6078180A Granted JPS569747A (en) | 1979-06-29 | 1980-05-09 | Producing reticules |
Country Status (7)
Country | Link |
---|---|
US (1) | US4306006A (ja) |
EP (1) | EP0021095B1 (ja) |
JP (1) | JPS569747A (ja) |
CA (1) | CA1156505A (ja) |
DE (1) | DE3069141D1 (ja) |
FR (1) | FR2460496A1 (ja) |
IT (1) | IT1149982B (ja) |
Families Citing this family (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4964146A (en) * | 1985-07-31 | 1990-10-16 | Hitachi, Ltd. | Pattern transistor mask and method of using the same |
GB2189903A (en) * | 1986-04-01 | 1987-11-04 | Plessey Co Plc | An etch technique for metal mask definition |
US6309926B1 (en) | 1998-12-04 | 2001-10-30 | Advanced Micro Devices | Thin resist with nitride hard mask for gate etch application |
US6749969B2 (en) | 2001-11-14 | 2004-06-15 | International Business Machines Corporation | Reverse tone process for masks |
Family Cites Families (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE1447976A1 (de) * | 1965-09-30 | 1969-10-09 | Telefunken Patent | Verfahren zum Herstellen von Belichtungsmasken mit hohem Kontrast |
US3877810A (en) * | 1972-11-08 | 1975-04-15 | Rca Corp | Method for making a photomask |
US3923568A (en) * | 1974-01-14 | 1975-12-02 | Int Plasma Corp | Dry plasma process for etching noble metal |
US3986876A (en) * | 1974-05-24 | 1976-10-19 | The United States Of America As Represented By The Secretary Of The Navy | Method for making a mask having a sloped relief |
US4092442A (en) * | 1976-12-30 | 1978-05-30 | International Business Machines Corporation | Method of depositing thin films utilizing a polyimide mask |
-
1979
- 1979-06-29 FR FR7917304A patent/FR2460496A1/fr not_active Withdrawn
-
1980
- 1980-05-09 JP JP6078180A patent/JPS569747A/ja active Granted
- 1980-05-21 CA CA000352379A patent/CA1156505A/en not_active Expired
- 1980-05-29 DE DE8080102985T patent/DE3069141D1/de not_active Expired
- 1980-05-29 EP EP80102985A patent/EP0021095B1/fr not_active Expired
- 1980-06-23 US US06/161,818 patent/US4306006A/en not_active Expired - Lifetime
- 1980-06-23 IT IT22954/80A patent/IT1149982B/it active
Also Published As
Publication number | Publication date |
---|---|
EP0021095B1 (fr) | 1984-09-12 |
FR2460496A1 (fr) | 1981-01-23 |
CA1156505A (en) | 1983-11-08 |
IT8022954A0 (it) | 1980-06-23 |
US4306006A (en) | 1981-12-15 |
JPS6154212B2 (ja) | 1986-11-21 |
IT1149982B (it) | 1986-12-10 |
DE3069141D1 (en) | 1984-10-18 |
EP0021095A1 (fr) | 1981-01-07 |
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