DE3069141D1 - Direct process for the production of chrome masks with a pattern generator - Google Patents

Direct process for the production of chrome masks with a pattern generator

Info

Publication number
DE3069141D1
DE3069141D1 DE8080102985T DE3069141T DE3069141D1 DE 3069141 D1 DE3069141 D1 DE 3069141D1 DE 8080102985 T DE8080102985 T DE 8080102985T DE 3069141 T DE3069141 T DE 3069141T DE 3069141 D1 DE3069141 D1 DE 3069141D1
Authority
DE
Germany
Prior art keywords
production
pattern generator
direct process
chrome masks
chrome
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
DE8080102985T
Other languages
English (en)
Inventor
Denis Descamps
Daniel Guermont
Zbigniew Piaczinski
Jacques Sautereau
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Compagnie IBM France SAS
International Business Machines Corp
Original Assignee
Compagnie IBM France SAS
International Business Machines Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Compagnie IBM France SAS, International Business Machines Corp filed Critical Compagnie IBM France SAS
Application granted granted Critical
Publication of DE3069141D1 publication Critical patent/DE3069141D1/de
Expired legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/42—Stripping or agents therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/16—Coating processes; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
DE8080102985T 1979-06-29 1980-05-29 Direct process for the production of chrome masks with a pattern generator Expired DE3069141D1 (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR7917304A FR2460496A1 (fr) 1979-06-29 1979-06-29 Procede pour fabriquer des reticules sur plaques chromees direc tement par un generateur d'images

Publications (1)

Publication Number Publication Date
DE3069141D1 true DE3069141D1 (en) 1984-10-18

Family

ID=9227473

Family Applications (1)

Application Number Title Priority Date Filing Date
DE8080102985T Expired DE3069141D1 (en) 1979-06-29 1980-05-29 Direct process for the production of chrome masks with a pattern generator

Country Status (7)

Country Link
US (1) US4306006A (de)
EP (1) EP0021095B1 (de)
JP (1) JPS569747A (de)
CA (1) CA1156505A (de)
DE (1) DE3069141D1 (de)
FR (1) FR2460496A1 (de)
IT (1) IT1149982B (de)

Families Citing this family (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4964146A (en) * 1985-07-31 1990-10-16 Hitachi, Ltd. Pattern transistor mask and method of using the same
GB2189903A (en) * 1986-04-01 1987-11-04 Plessey Co Plc An etch technique for metal mask definition
US6309926B1 (en) 1998-12-04 2001-10-30 Advanced Micro Devices Thin resist with nitride hard mask for gate etch application
US6749969B2 (en) 2001-11-14 2004-06-15 International Business Machines Corporation Reverse tone process for masks

Family Cites Families (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1447976A1 (de) * 1965-09-30 1969-10-09 Telefunken Patent Verfahren zum Herstellen von Belichtungsmasken mit hohem Kontrast
US3877810A (en) * 1972-11-08 1975-04-15 Rca Corp Method for making a photomask
US3923568A (en) * 1974-01-14 1975-12-02 Int Plasma Corp Dry plasma process for etching noble metal
US3986876A (en) * 1974-05-24 1976-10-19 The United States Of America As Represented By The Secretary Of The Navy Method for making a mask having a sloped relief
US4092442A (en) * 1976-12-30 1978-05-30 International Business Machines Corporation Method of depositing thin films utilizing a polyimide mask

Also Published As

Publication number Publication date
US4306006A (en) 1981-12-15
IT8022954A0 (it) 1980-06-23
FR2460496A1 (fr) 1981-01-23
EP0021095B1 (de) 1984-09-12
CA1156505A (en) 1983-11-08
JPS6154212B2 (de) 1986-11-21
IT1149982B (it) 1986-12-10
JPS569747A (en) 1981-01-31
EP0021095A1 (de) 1981-01-07

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Legal Events

Date Code Title Description
8339 Ceased/non-payment of the annual fee