JPS5691236A - Liquid corrector for photomechanical plate - Google Patents

Liquid corrector for photomechanical plate

Info

Publication number
JPS5691236A
JPS5691236A JP16908779A JP16908779A JPS5691236A JP S5691236 A JPS5691236 A JP S5691236A JP 16908779 A JP16908779 A JP 16908779A JP 16908779 A JP16908779 A JP 16908779A JP S5691236 A JPS5691236 A JP S5691236A
Authority
JP
Japan
Prior art keywords
corrector
rubber
plate
photomechanical
synthetic
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16908779A
Other languages
English (en)
Japanese (ja)
Other versions
JPH0154692B2 (enrdf_load_stackoverflow
Inventor
Akira Ono
Masao Tokura
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
UENO KAGAKU KOGYO KK
Original Assignee
UENO KAGAKU KOGYO KK
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by UENO KAGAKU KOGYO KK filed Critical UENO KAGAKU KOGYO KK
Priority to JP16908779A priority Critical patent/JPS5691236A/ja
Publication of JPS5691236A publication Critical patent/JPS5691236A/ja
Publication of JPH0154692B2 publication Critical patent/JPH0154692B2/ja
Granted legal-status Critical Current

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/26—Processing photosensitive materials; Apparatus therefor
    • G03F7/40—Treatment after imagewise removal, e.g. baking

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Preparing Plates And Mask In Photomechanical Process (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP16908779A 1979-12-25 1979-12-25 Liquid corrector for photomechanical plate Granted JPS5691236A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16908779A JPS5691236A (en) 1979-12-25 1979-12-25 Liquid corrector for photomechanical plate

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16908779A JPS5691236A (en) 1979-12-25 1979-12-25 Liquid corrector for photomechanical plate

Publications (2)

Publication Number Publication Date
JPS5691236A true JPS5691236A (en) 1981-07-24
JPH0154692B2 JPH0154692B2 (enrdf_load_stackoverflow) 1989-11-20

Family

ID=15880079

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16908779A Granted JPS5691236A (en) 1979-12-25 1979-12-25 Liquid corrector for photomechanical plate

Country Status (1)

Country Link
JP (1) JPS5691236A (enrdf_load_stackoverflow)

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53119102A (en) * 1977-03-25 1978-10-18 Gen Corp Retouching solution for photographic engraving

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS53119102A (en) * 1977-03-25 1978-10-18 Gen Corp Retouching solution for photographic engraving

Also Published As

Publication number Publication date
JPH0154692B2 (enrdf_load_stackoverflow) 1989-11-20

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