JPS5690834A - Coating resin - Google Patents
Coating resinInfo
- Publication number
- JPS5690834A JPS5690834A JP16812479A JP16812479A JPS5690834A JP S5690834 A JPS5690834 A JP S5690834A JP 16812479 A JP16812479 A JP 16812479A JP 16812479 A JP16812479 A JP 16812479A JP S5690834 A JPS5690834 A JP S5690834A
- Authority
- JP
- Japan
- Prior art keywords
- resin
- flattening
- coating
- film
- soluble
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/0001—Technical content checked by a classifier
- H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
Landscapes
- Polymers With Sulfur, Phosphorus Or Metals In The Main Chain (AREA)
- Paints Or Removers (AREA)
- Macromolecular Compounds Obtained By Forming Nitrogen-Containing Linkages In General (AREA)
- Organic Insulating Materials (AREA)
Abstract
PURPOSE:To provide the titled insulating resin which has excelleent film-forming properties, flattening ability and coating properties and produces cured articles having excellent heat resistance, consisting of an addition polymn. type polyimide which has a specified MW range and is soluble in ketone solvents. CONSTITUTION:There is provided a coating resin consisting of an addition polymn. type polyimide of formula I (wherein R is a bivalent arom. group contg. no active hydrogen; Y is a radical of formula II or III; n is a positive integer) which has a MW of 1,000-10,000 and is soluble in ketone solvents (e.g. acetophenone, isophorone and the like). Since low-molecular compd. such as water are not produced by curing reaction a defect such as blistering in coating film is difficultly caused and shrinkage on curing is reduced. Thus, the resin excels in flattening uneven surfaces. When the MW of the resin is in the above MW range, the resin exhibits excellent film-forming properties so that fine wrinkles are not formed and the insufficient flattening of the surfaces is not conducted.
Priority Applications (4)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16812479A JPS5690834A (en) | 1979-12-26 | 1979-12-26 | Coating resin |
DE8080301413T DE3060913D1 (en) | 1979-05-12 | 1980-04-30 | Improvement in method of manufacturing electronic device having multilayer wiring structure |
EP80301413A EP0019391B1 (en) | 1979-05-12 | 1980-04-30 | Improvement in method of manufacturing electronic device having multilayer wiring structure |
US06/148,722 US4347306A (en) | 1979-05-12 | 1980-05-12 | Method of manufacturing electronic device having multilayer wiring structure |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP16812479A JPS5690834A (en) | 1979-12-26 | 1979-12-26 | Coating resin |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5690834A true JPS5690834A (en) | 1981-07-23 |
JPS6320853B2 JPS6320853B2 (en) | 1988-04-30 |
Family
ID=15862286
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP16812479A Granted JPS5690834A (en) | 1979-05-12 | 1979-12-26 | Coating resin |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5690834A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57121064A (en) * | 1981-01-02 | 1982-07-28 | Ibm | Formation of surface-even thin film |
JPS59186204A (en) * | 1983-04-05 | 1984-10-23 | 株式会社日立製作所 | Method of forming wiring structure |
JP2001160508A (en) * | 1999-09-24 | 2001-06-12 | Sumitomo Special Metals Co Ltd | R-Fe-B PERMANENT MAGNET AND ITS MANUFACTURING METHOD |
-
1979
- 1979-12-26 JP JP16812479A patent/JPS5690834A/en active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS57121064A (en) * | 1981-01-02 | 1982-07-28 | Ibm | Formation of surface-even thin film |
JPS6248555B2 (en) * | 1981-01-02 | 1987-10-14 | Intaanashonaru Bijinesu Mashiinzu Corp | |
JPS59186204A (en) * | 1983-04-05 | 1984-10-23 | 株式会社日立製作所 | Method of forming wiring structure |
JPH0125162B2 (en) * | 1983-04-05 | 1989-05-16 | Hitachi Ltd | |
JP2001160508A (en) * | 1999-09-24 | 2001-06-12 | Sumitomo Special Metals Co Ltd | R-Fe-B PERMANENT MAGNET AND ITS MANUFACTURING METHOD |
Also Published As
Publication number | Publication date |
---|---|
JPS6320853B2 (en) | 1988-04-30 |
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