JPS5684782A - Cleaning abrasive material for electrophotographic photosensitive material - Google Patents

Cleaning abrasive material for electrophotographic photosensitive material

Info

Publication number
JPS5684782A
JPS5684782A JP16254179A JP16254179A JPS5684782A JP S5684782 A JPS5684782 A JP S5684782A JP 16254179 A JP16254179 A JP 16254179A JP 16254179 A JP16254179 A JP 16254179A JP S5684782 A JPS5684782 A JP S5684782A
Authority
JP
Japan
Prior art keywords
abrasive material
abrasive
materials
photosensitive
rigid
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP16254179A
Other languages
Japanese (ja)
Other versions
JPS6144114B2 (en
Inventor
Kazunari Aida
Yoshitake Takahashi
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Fuji Electric Co Ltd
Original Assignee
Fuji Electric Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Electric Co Ltd filed Critical Fuji Electric Co Ltd
Priority to JP16254179A priority Critical patent/JPS5684782A/en
Publication of JPS5684782A publication Critical patent/JPS5684782A/en
Publication of JPS6144114B2 publication Critical patent/JPS6144114B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To provide an abrasive material which can adequately remove any deposited materials, an deteriorated surface layer and a surface defect for the regeneration of photosensitive material, by a method wherein two or more kinds of abrasive materials having different hardness are mixed together.
CONSTITUTION: There is provided a cleaning abrasive material for electrophotographic photosensitive materials, said cleaning abrasive material being obtd. by mixing together two or more kinds of abrasive materials having different hardness. For example, a mixt. of 20g of a polymethylsilsesquioxane powder having a particle diameter of 5W40μm as a soft abrasive material and 0.5g of a noncrystalline silicon oxide powder having a particle diameter of 5W40μm as a rigid abrasive material, is dispersed in 50ml of ethanol to obtain the desired abrasive material. Cerium oxide, calcium oxide or diatomaceous earth can also be used. The rigid material shaves off the surface of a photosensitive layer. The soft material has a cushion effect on the rigid material, softens abrasion effect, and makes a polished surface smooth to finish the surface of the photosensitive material to a surface which is nearly a mirror surface.
COPYRIGHT: (C)1981,JPO&Japio
JP16254179A 1979-12-14 1979-12-14 Cleaning abrasive material for electrophotographic photosensitive material Granted JPS5684782A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP16254179A JPS5684782A (en) 1979-12-14 1979-12-14 Cleaning abrasive material for electrophotographic photosensitive material

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP16254179A JPS5684782A (en) 1979-12-14 1979-12-14 Cleaning abrasive material for electrophotographic photosensitive material

Publications (2)

Publication Number Publication Date
JPS5684782A true JPS5684782A (en) 1981-07-10
JPS6144114B2 JPS6144114B2 (en) 1986-10-01

Family

ID=15756560

Family Applications (1)

Application Number Title Priority Date Filing Date
JP16254179A Granted JPS5684782A (en) 1979-12-14 1979-12-14 Cleaning abrasive material for electrophotographic photosensitive material

Country Status (1)

Country Link
JP (1) JPS5684782A (en)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6172278A (en) * 1984-09-17 1986-04-14 Arai Pump Mfg Co Ltd Cleaning roller
US6878631B2 (en) * 2002-08-22 2005-04-12 Kabushiki Kaisha Toshiba Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6172278A (en) * 1984-09-17 1986-04-14 Arai Pump Mfg Co Ltd Cleaning roller
JPH0464067B2 (en) * 1984-09-17 1992-10-13 Arai Pump Mfg
US6878631B2 (en) * 2002-08-22 2005-04-12 Kabushiki Kaisha Toshiba Abrasive used for planarization of semiconductor device and method of manufacturing semiconductor device using the abrasive

Also Published As

Publication number Publication date
JPS6144114B2 (en) 1986-10-01

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