JPS5680047A - Lithographic plate requiring no dampening water - Google Patents
Lithographic plate requiring no dampening waterInfo
- Publication number
- JPS5680047A JPS5680047A JP15836179A JP15836179A JPS5680047A JP S5680047 A JPS5680047 A JP S5680047A JP 15836179 A JP15836179 A JP 15836179A JP 15836179 A JP15836179 A JP 15836179A JP S5680047 A JPS5680047 A JP S5680047A
- Authority
- JP
- Japan
- Prior art keywords
- photosensitive layer
- photosensitive
- plate
- developer
- layer
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 title abstract 2
- 239000000126 substance Substances 0.000 abstract 3
- 239000011159 matrix material Substances 0.000 abstract 2
- 229920002379 silicone rubber Polymers 0.000 abstract 2
- 239000004945 silicone rubber Substances 0.000 abstract 2
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 abstract 1
- 239000004743 Polypropylene Substances 0.000 abstract 1
- 229920001971 elastomer Polymers 0.000 abstract 1
- 238000004519 manufacturing process Methods 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- -1 polypropylene Polymers 0.000 abstract 1
- 229920001155 polypropylene Polymers 0.000 abstract 1
- 229920005989 resin Polymers 0.000 abstract 1
- 239000011347 resin Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/075—Silicon-containing compounds
- G03F7/0752—Silicon-containing compounds in non photosensitive layers or as additives, e.g. for dry lithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Photosensitive Polymer And Photoresist Processing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15836179A JPS5680047A (en) | 1979-12-06 | 1979-12-06 | Lithographic plate requiring no dampening water |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP15836179A JPS5680047A (en) | 1979-12-06 | 1979-12-06 | Lithographic plate requiring no dampening water |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5680047A true JPS5680047A (en) | 1981-07-01 |
JPS6154223B2 JPS6154223B2 (enrdf_load_stackoverflow) | 1986-11-21 |
Family
ID=15669989
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP15836179A Granted JPS5680047A (en) | 1979-12-06 | 1979-12-06 | Lithographic plate requiring no dampening water |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5680047A (enrdf_load_stackoverflow) |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5860744A (ja) * | 1981-10-08 | 1983-04-11 | Toray Ind Inc | 湿し水不要ネガ型平版印刷版 |
US5571658A (en) * | 1994-09-07 | 1996-11-05 | Fuji Photo Film Co., Ltd. | Photosensitive plate having a photopolymerizable photosensitive layer and a silicone rubber layer for preparing a lithographic printing plate requiring no fountain solution |
EP1249341A1 (en) * | 2001-04-09 | 2002-10-16 | Agfa-Gevaert | Lithographic printing plate precursor |
EP1256444A1 (en) * | 2001-04-09 | 2002-11-13 | Agfa-Gevaert | Positive-working lithographic printing plate precursor |
US6846613B2 (en) | 2001-04-09 | 2005-01-25 | Agfa-Gevaert | Positive-working lithographic printing plate precursors |
-
1979
- 1979-12-06 JP JP15836179A patent/JPS5680047A/ja active Granted
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5860744A (ja) * | 1981-10-08 | 1983-04-11 | Toray Ind Inc | 湿し水不要ネガ型平版印刷版 |
US5571658A (en) * | 1994-09-07 | 1996-11-05 | Fuji Photo Film Co., Ltd. | Photosensitive plate having a photopolymerizable photosensitive layer and a silicone rubber layer for preparing a lithographic printing plate requiring no fountain solution |
EP1249341A1 (en) * | 2001-04-09 | 2002-10-16 | Agfa-Gevaert | Lithographic printing plate precursor |
EP1256444A1 (en) * | 2001-04-09 | 2002-11-13 | Agfa-Gevaert | Positive-working lithographic printing plate precursor |
US6846613B2 (en) | 2001-04-09 | 2005-01-25 | Agfa-Gevaert | Positive-working lithographic printing plate precursors |
Also Published As
Publication number | Publication date |
---|---|
JPS6154223B2 (enrdf_load_stackoverflow) | 1986-11-21 |
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