JPS5664338A - Method of forming polymer type image - Google Patents

Method of forming polymer type image

Info

Publication number
JPS5664338A
JPS5664338A JP13174780A JP13174780A JPS5664338A JP S5664338 A JPS5664338 A JP S5664338A JP 13174780 A JP13174780 A JP 13174780A JP 13174780 A JP13174780 A JP 13174780A JP S5664338 A JPS5664338 A JP S5664338A
Authority
JP
Japan
Prior art keywords
type image
forming polymer
polymer type
image
forming
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP13174780A
Other languages
Japanese (ja)
Inventor
Furanshisuko Pazoru Jiyoze
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
EIDP Inc
Original Assignee
EI Du Pont de Nemours and Co
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by EI Du Pont de Nemours and Co filed Critical EI Du Pont de Nemours and Co
Publication of JPS5664338A publication Critical patent/JPS5664338A/en
Pending legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/027Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F2/00Processes of polymerisation
    • C08F2/46Polymerisation initiated by wave energy or particle radiation
    • C08F2/48Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light
    • C08F2/50Polymerisation initiated by wave energy or particle radiation by ultraviolet or visible light with sensitising agents

Landscapes

  • Physics & Mathematics (AREA)
  • Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Organic Chemistry (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
  • Polymerisation Methods In General (AREA)
JP13174780A 1976-03-17 1980-09-24 Method of forming polymer type image Pending JPS5664338A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US66753676A 1976-03-17 1976-03-17

Publications (1)

Publication Number Publication Date
JPS5664338A true JPS5664338A (en) 1981-06-01

Family

ID=24678609

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13174780A Pending JPS5664338A (en) 1976-03-17 1980-09-24 Method of forming polymer type image

Country Status (2)

Country Link
JP (1) JPS5664338A (en)
BE (1) BE852517A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5953444A (en) * 1982-08-18 1984-03-28 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− Acidic o-nitroaromatic compound

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52111985A (en) * 1976-03-17 1977-09-20 Du Pont Photopolymerizable composition containing photosensitive inhibitor composed of oonitro aromatic compound

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS52111985A (en) * 1976-03-17 1977-09-20 Du Pont Photopolymerizable composition containing photosensitive inhibitor composed of oonitro aromatic compound

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5953444A (en) * 1982-08-18 1984-03-28 イ−・アイ・デユポン・ド・ネモア−ス・アンド・コンパニ− Acidic o-nitroaromatic compound

Also Published As

Publication number Publication date
BE852517A (en) 1977-09-16

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