JPS5656635A - Correcting method for photoresist pattern - Google Patents
Correcting method for photoresist patternInfo
- Publication number
- JPS5656635A JPS5656635A JP13460979A JP13460979A JPS5656635A JP S5656635 A JPS5656635 A JP S5656635A JP 13460979 A JP13460979 A JP 13460979A JP 13460979 A JP13460979 A JP 13460979A JP S5656635 A JPS5656635 A JP S5656635A
- Authority
- JP
- Japan
- Prior art keywords
- coordinate
- wafer
- cut
- etching
- jig
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
- 238000000034 method Methods 0.000 title abstract 2
- 229920002120 photoresistant polymer Polymers 0.000 title 1
- 238000005530 etching Methods 0.000 abstract 4
- 239000011248 coating agent Substances 0.000 abstract 1
- 238000000576 coating method Methods 0.000 abstract 1
- 239000002245 particle Substances 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/04—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer
- H01L21/18—Manufacture or treatment of semiconductor devices or of parts thereof the devices having potential barriers, e.g. a PN junction, depletion layer or carrier concentration layer the devices having semiconductor bodies comprising elements of Group IV of the Periodic Table or AIIIBV compounds with or without impurities, e.g. doping materials
- H01L21/30—Treatment of semiconductor bodies using processes or apparatus not provided for in groups H01L21/20 - H01L21/26
Landscapes
- Engineering & Computer Science (AREA)
- Physics & Mathematics (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Abstract
PURPOSE:To shorten a correcting process for resist pattern sharply by sticking a charged etching resisting matter when a cut is detected on the pattern. CONSTITUTION:A notch on a wafer 17 is contacted to a plane of a notch detecting jig 14 by means of said jig 14, a fixed jig 15 and a control system 16, which is scanned for judgement on availability as compared with an original pattern. When a cut is found on a coordinate (a, b) in a resist pattern on the wafer, electromagnet plates 21-24 are actuated 20 to recognize the coordinate and the cut, and a needle electrode 25 is controlled positionally to the coordinate (a, b) from behind the wafer. On the top of the wafer, an electrode 28 under a spot coating device 26 for etching resisting matter which works as a nozzle at the same time is controlled positionally to the coordinate (a, b) by control systems 20, 27. High voltage is applied on the electrodes 28, 25 through the control system 20, thereby sticking a charged particle 29 of the etching resisting matter to the cut. Where a short circuit is detected on the coordinate (c, d) the nose of a device 31 for laser beam or the like is introduced to the coordinate (c, d) in the same way, thus etching the short circuit.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13460979A JPS5656635A (en) | 1979-10-15 | 1979-10-15 | Correcting method for photoresist pattern |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13460979A JPS5656635A (en) | 1979-10-15 | 1979-10-15 | Correcting method for photoresist pattern |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| JPS5656635A true JPS5656635A (en) | 1981-05-18 |
Family
ID=15132392
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13460979A Pending JPS5656635A (en) | 1979-10-15 | 1979-10-15 | Correcting method for photoresist pattern |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5656635A (en) |
-
1979
- 1979-10-15 JP JP13460979A patent/JPS5656635A/en active Pending
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