JPS5653847B2 - - Google Patents
Info
- Publication number
- JPS5653847B2 JPS5653847B2 JP13116578A JP13116578A JPS5653847B2 JP S5653847 B2 JPS5653847 B2 JP S5653847B2 JP 13116578 A JP13116578 A JP 13116578A JP 13116578 A JP13116578 A JP 13116578A JP S5653847 B2 JPS5653847 B2 JP S5653847B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y40/00—Manufacture or treatment of nanostructures
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/317—Electron-beam or ion-beam tubes for localised treatment of objects for changing properties of the objects or for applying thin layers thereon, e.g. for ion implantation
- H01J37/3174—Particle-beam lithography, e.g. electron beam lithography
- H01J37/3175—Projection methods, i.e. transfer substantially complete pattern to substrate
Landscapes
- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Nanotechnology (AREA)
- Physics & Mathematics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Manufacturing & Machinery (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13116578A JPS5558528A (en) | 1978-10-25 | 1978-10-25 | Electron beam projecting/imaging device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP13116578A JPS5558528A (en) | 1978-10-25 | 1978-10-25 | Electron beam projecting/imaging device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5558528A JPS5558528A (en) | 1980-05-01 |
| JPS5653847B2 true JPS5653847B2 (US06826419-20041130-M00005.png) | 1981-12-22 |
Family
ID=15051518
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP13116578A Granted JPS5558528A (en) | 1978-10-25 | 1978-10-25 | Electron beam projecting/imaging device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5558528A (US06826419-20041130-M00005.png) |
Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5385176A (en) * | 1977-01-04 | 1978-07-27 | Siemens Ag | Photoelectric picture projector |
-
1978
- 1978-10-25 JP JP13116578A patent/JPS5558528A/ja active Granted
Patent Citations (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5385176A (en) * | 1977-01-04 | 1978-07-27 | Siemens Ag | Photoelectric picture projector |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5558528A (en) | 1980-05-01 |
