JPS565061B2 - - Google Patents
Info
- Publication number
- JPS565061B2 JPS565061B2 JP4278676A JP4278676A JPS565061B2 JP S565061 B2 JPS565061 B2 JP S565061B2 JP 4278676 A JP4278676 A JP 4278676A JP 4278676 A JP4278676 A JP 4278676A JP S565061 B2 JPS565061 B2 JP S565061B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/24—Vacuum evaporation
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Physical Vapour Deposition (AREA)
- Electrodes Of Semiconductors (AREA)
- Physical Deposition Of Substances That Are Components Of Semiconductor Devices (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4278676A JPS52126168A (en) | 1976-04-15 | 1976-04-15 | Preparing device for thin films |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4278676A JPS52126168A (en) | 1976-04-15 | 1976-04-15 | Preparing device for thin films |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52126168A JPS52126168A (en) | 1977-10-22 |
| JPS565061B2 true JPS565061B2 (Direct) | 1981-02-03 |
Family
ID=12645635
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4278676A Granted JPS52126168A (en) | 1976-04-15 | 1976-04-15 | Preparing device for thin films |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52126168A (Direct) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS60119710A (ja) * | 1983-12-02 | 1985-06-27 | Nippon Telegr & Teleph Corp <Ntt> | 薄膜製造方法 |
| JPH07122134B2 (ja) * | 1987-10-05 | 1995-12-25 | 石川島播磨重工業株式会社 | イオンプレーティング方法 |
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1976
- 1976-04-15 JP JP4278676A patent/JPS52126168A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52126168A (en) | 1977-10-22 |