JPS565025Y2 - - Google Patents
Info
- Publication number
- JPS565025Y2 JPS565025Y2 JP2951676U JP2951676U JPS565025Y2 JP S565025 Y2 JPS565025 Y2 JP S565025Y2 JP 2951676 U JP2951676 U JP 2951676U JP 2951676 U JP2951676 U JP 2951676U JP S565025 Y2 JPS565025 Y2 JP S565025Y2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Other Air-Conditioning Systems (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2951676U JPS565025Y2 (en) | 1976-03-11 | 1976-03-11 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2951676U JPS565025Y2 (en) | 1976-03-11 | 1976-03-11 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52121152U JPS52121152U (en) | 1977-09-14 |
| JPS565025Y2 true JPS565025Y2 (en) | 1981-02-03 |
Family
ID=28489104
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP2951676U Expired JPS565025Y2 (en) | 1976-03-11 | 1976-03-11 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS565025Y2 (en) |
Cited By (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6112068A (en) * | 1984-06-21 | 1986-01-20 | バリアン・アソシエイツ・インコーポレイテツド | Method of correcting proximity effect in electronic beam lithographic device |
| JPS627129A (en) * | 1985-07-03 | 1987-01-14 | Nippon Kogaku Kk <Nikon> | Exposure and exposure system with projection exposure device |
| JP6840906B1 (en) * | 2020-06-18 | 2021-03-10 | 三菱電機ビルテクノサービス株式会社 | Refrigerant recovery system and refrigerant recovery method |
-
1976
- 1976-03-11 JP JP2951676U patent/JPS565025Y2/ja not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6112068A (en) * | 1984-06-21 | 1986-01-20 | バリアン・アソシエイツ・インコーポレイテツド | Method of correcting proximity effect in electronic beam lithographic device |
| JPS627129A (en) * | 1985-07-03 | 1987-01-14 | Nippon Kogaku Kk <Nikon> | Exposure and exposure system with projection exposure device |
| JP6840906B1 (en) * | 2020-06-18 | 2021-03-10 | 三菱電機ビルテクノサービス株式会社 | Refrigerant recovery system and refrigerant recovery method |
| WO2021255895A1 (en) * | 2020-06-18 | 2021-12-23 | 三菱電機ビルテクノサービス株式会社 | Refrigerant recovery system and refrigerant recovery method |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52121152U (en) | 1977-09-14 |