JPS5649450B2 - - Google Patents
Info
- Publication number
- JPS5649450B2 JPS5649450B2 JP7293178A JP7293178A JPS5649450B2 JP S5649450 B2 JPS5649450 B2 JP S5649450B2 JP 7293178 A JP7293178 A JP 7293178A JP 7293178 A JP7293178 A JP 7293178A JP S5649450 B2 JPS5649450 B2 JP S5649450B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Electron Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7293178A JPS551110A (en) | 1978-06-16 | 1978-06-16 | Exposure to electron beam |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP7293178A JPS551110A (en) | 1978-06-16 | 1978-06-16 | Exposure to electron beam |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS551110A JPS551110A (en) | 1980-01-07 |
| JPS5649450B2 true JPS5649450B2 (enrdf_load_stackoverflow) | 1981-11-21 |
Family
ID=13503592
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP7293178A Granted JPS551110A (en) | 1978-06-16 | 1978-06-16 | Exposure to electron beam |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS551110A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63134348U (enrdf_load_stackoverflow) * | 1987-02-25 | 1988-09-02 |
Families Citing this family (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS56150825A (en) * | 1980-04-24 | 1981-11-21 | Toshiba Corp | Manufacture of semiconductor device |
| JPS5713741A (en) * | 1980-06-27 | 1982-01-23 | Nec Corp | Emitting method for charged particle beam in manufacture of semiconductor device |
| JPS57193030A (en) * | 1981-05-25 | 1982-11-27 | Nec Corp | Emitting method for charged particle beam in manufacture of semiconductor device |
| JPS60208827A (ja) * | 1984-04-03 | 1985-10-21 | Fujitsu Ltd | マスク基板の露光方法 |
Family Cites Families (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS52135681A (en) * | 1976-05-10 | 1977-11-12 | Toshiba Corp | Electron beam exposure apparatus |
-
1978
- 1978-06-16 JP JP7293178A patent/JPS551110A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS63134348U (enrdf_load_stackoverflow) * | 1987-02-25 | 1988-09-02 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS551110A (en) | 1980-01-07 |