JPS5646255B2 - - Google Patents
Info
- Publication number
- JPS5646255B2 JPS5646255B2 JP3541577A JP3541577A JPS5646255B2 JP S5646255 B2 JPS5646255 B2 JP S5646255B2 JP 3541577 A JP3541577 A JP 3541577A JP 3541577 A JP3541577 A JP 3541577A JP S5646255 B2 JPS5646255 B2 JP S5646255B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F9/00—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
- G03F9/70—Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3541577A JPS53121471A (en) | 1977-03-31 | 1977-03-31 | Automatic position matching device |
| US05/891,301 US4266876A (en) | 1977-03-31 | 1978-03-29 | Automatic alignment apparatus |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP3541577A JPS53121471A (en) | 1977-03-31 | 1977-03-31 | Automatic position matching device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS53121471A JPS53121471A (en) | 1978-10-23 |
| JPS5646255B2 true JPS5646255B2 (enExample) | 1981-10-31 |
Family
ID=12441236
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP3541577A Granted JPS53121471A (en) | 1977-03-31 | 1977-03-31 | Automatic position matching device |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US4266876A (enExample) |
| JP (1) | JPS53121471A (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10738101B2 (en) | 2015-05-29 | 2020-08-11 | Kao Corporation | Method for selecting odor-controlling substance |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US4465374A (en) * | 1979-02-27 | 1984-08-14 | Diffracto Ltd. | Method and apparatus for determining dimensional information concerning an object |
| JPS5673437A (en) * | 1979-11-20 | 1981-06-18 | Fujitsu Ltd | Far-ultraviolet light exposing method and device |
| US4406949A (en) * | 1981-07-13 | 1983-09-27 | Mostek Corporation | Method and apparatus for aligning an integrated circuit |
| JPS5963503A (ja) * | 1982-10-02 | 1984-04-11 | Canon Inc | マ−ク位置検出方法 |
| JPS5994419A (ja) * | 1982-11-19 | 1984-05-31 | Canon Inc | 分割焼付け装置におけるアライメント方法 |
| JPS59100805A (ja) * | 1982-12-01 | 1984-06-11 | Canon Inc | 物体観察装置 |
| SE456194B (sv) * | 1983-01-31 | 1988-09-12 | Semyre Electronics Ab | Avsokningsanordning |
| JPS60163110A (ja) * | 1984-02-06 | 1985-08-26 | Canon Inc | 位置合わせ装置 |
| DE3512615A1 (de) * | 1985-04-06 | 1986-10-16 | Ernst Leitz Wetzlar Gmbh, 6330 Wetzlar | Anordnung zur ausrichtung, pruefung und/oder vermessung zweidimensionaler objekte |
| US6072625A (en) * | 1997-02-03 | 2000-06-06 | Olympus Optical Co., Ltd. | Optical microscope apparatus |
| US6801314B2 (en) * | 2001-09-28 | 2004-10-05 | Infineon Technologies Ag | Alignment system and method using bright spot and box structure |
Family Cites Families (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| FR887031A (fr) * | 1940-01-30 | 1943-11-02 | Licentia Gmbh | Procédé et dispositif de mesure différentielle photo-électrique |
| US3345912A (en) * | 1964-03-10 | 1967-10-10 | Ibm | Rotary shearing interferometer |
| US3549805A (en) * | 1967-10-26 | 1970-12-22 | Singer Inc H R B | Optical scanning system with multiple channel output |
| US3535527A (en) * | 1968-04-26 | 1970-10-20 | North American Rockwell | Digital correlation pattern tracker with single axis scanning |
| US3776995A (en) * | 1970-10-15 | 1973-12-04 | Xerox Corp | Method of producing x-ray diffraction grating |
| US3955072A (en) * | 1971-03-22 | 1976-05-04 | Kasper Instruments, Inc. | Apparatus for the automatic alignment of two superimposed objects for example a semiconductor wafer and a transparent mask |
| US3739247A (en) * | 1971-05-17 | 1973-06-12 | Canon Kk | Positioning device using photoelectric scanning |
| US3818444A (en) * | 1972-06-29 | 1974-06-18 | Pitney Bowes Inc | Optical bar code reading method and apparatus having an x scan pattern |
| US3989385A (en) * | 1974-09-16 | 1976-11-02 | International Business Machines Corporation | Part locating, mask alignment and mask alignment verification system |
| JPS5212577A (en) * | 1975-07-21 | 1977-01-31 | Nippon Kogaku Kk <Nikon> | Automatic location device |
| JPS52109875A (en) * | 1976-02-25 | 1977-09-14 | Hitachi Ltd | Position matching system for mask and wafer and its unit |
-
1977
- 1977-03-31 JP JP3541577A patent/JPS53121471A/ja active Granted
-
1978
- 1978-03-29 US US05/891,301 patent/US4266876A/en not_active Expired - Lifetime
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US10738101B2 (en) | 2015-05-29 | 2020-08-11 | Kao Corporation | Method for selecting odor-controlling substance |
Also Published As
| Publication number | Publication date |
|---|---|
| US4266876A (en) | 1981-05-12 |
| JPS53121471A (en) | 1978-10-23 |