JPS564387A - Charge particle beam device - Google Patents
Charge particle beam deviceInfo
- Publication number
- JPS564387A JPS564387A JP8036579A JP8036579A JPS564387A JP S564387 A JPS564387 A JP S564387A JP 8036579 A JP8036579 A JP 8036579A JP 8036579 A JP8036579 A JP 8036579A JP S564387 A JPS564387 A JP S564387A
- Authority
- JP
- Japan
- Prior art keywords
- source
- welding
- signal
- welding depth
- becomes
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Landscapes
- Welding Or Cutting Using Electron Beams (AREA)
Abstract
PURPOSE: To maintain welding depth constant and make welding strength even and sufficient by feeding the output signal of a detector which detects infrared rays generated in the material surface on the opposite side through projection of charge particle beams to the material, back to the charge particle beam generating source.
CONSTITUTION: Electric current is supplied to a filament 1 by a filament electric power source 2 to let electrons be generated. These are then projected as an electron beam 8 to the materials 9 to be welded to let heat be evolved so that the surrounding metal is melted by this heat and welding is thus accomplished. The deeper the welding depth becomes, the higher the temperature near the P point becomes and the larger the infrared ray amount emitted from the portion near the P point becomes, resulting in increased output signal from an infrared ray detector 11, but when the signal amount supplied to a differential amplifier 13 becomes larger than the reference signal from a reference signal source 14, the electric source 4 is so controlled that the signal of the amplifier 13 being fed back to the electric source 4 increases grid voltage, by which the electric current of the electron beam 8 is decreases and the welding depth is controlled in the decreasing direction. In this way, the welding depth is maintained always constant.
COPYRIGHT: (C)1981,JPO&Japio
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8036579A JPS564387A (en) | 1979-06-26 | 1979-06-26 | Charge particle beam device |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP8036579A JPS564387A (en) | 1979-06-26 | 1979-06-26 | Charge particle beam device |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS564387A true JPS564387A (en) | 1981-01-17 |
Family
ID=13716226
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP8036579A Pending JPS564387A (en) | 1979-06-26 | 1979-06-26 | Charge particle beam device |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS564387A (en) |
-
1979
- 1979-06-26 JP JP8036579A patent/JPS564387A/en active Pending
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