JPS5641989B2 - - Google Patents
Info
- Publication number
- JPS5641989B2 JPS5641989B2 JP8252873A JP8252873A JPS5641989B2 JP S5641989 B2 JPS5641989 B2 JP S5641989B2 JP 8252873 A JP8252873 A JP 8252873A JP 8252873 A JP8252873 A JP 8252873A JP S5641989 B2 JPS5641989 B2 JP S5641989B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/50—Mask blanks not covered by G03F1/20 - G03F1/34; Preparation thereof
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/051—Etching
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/085—Isolated-integrated
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/106—Masks, special
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10S—TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10S148/00—Metal treatment
- Y10S148/15—Silicon on sapphire SOS
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- ing And Chemical Polishing (AREA)
- Drying Of Semiconductors (AREA)
- Chemical Vapour Deposition (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| US00273560A US3814641A (en) | 1972-07-20 | 1972-07-20 | Process of fabricating silicon photomask |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS4953380A JPS4953380A (enExample) | 1974-05-23 |
| JPS5641989B2 true JPS5641989B2 (enExample) | 1981-10-01 |
Family
ID=23044450
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8252873A Expired JPS5641989B2 (enExample) | 1972-07-20 | 1973-07-19 |
Country Status (2)
| Country | Link |
|---|---|
| US (1) | US3814641A (enExample) |
| JP (1) | JPS5641989B2 (enExample) |
Families Citing this family (10)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS51948A (en) * | 1974-06-21 | 1976-01-07 | Dainippon Printing Co Ltd | Hotomasukuno seizohoho |
| DE2447225C2 (de) * | 1974-10-03 | 1983-12-22 | Ibm Deutschland Gmbh, 7000 Stuttgart | Verfahren zum Ablösen von positiven Photolack |
| JPS5621147B2 (enExample) * | 1974-10-04 | 1981-05-18 | ||
| JPS5826018B2 (ja) * | 1976-09-11 | 1983-05-31 | 株式会社ニコン | イオンプレ−テイング法による着色透明フオトマスクブランク材の作成方法 |
| JPS55121441A (en) * | 1979-03-14 | 1980-09-18 | Fujitsu Ltd | Mask for far ultraviolet exposure |
| US4401367A (en) * | 1980-11-03 | 1983-08-30 | United Technologies Corporation | Method for pattern masking objects and the products thereof |
| US4436593A (en) | 1981-07-13 | 1984-03-13 | Memorex Corporation | Self-aligned pole tips |
| US5286581A (en) * | 1991-08-19 | 1994-02-15 | Motorola, Inc. | Phase-shift mask and method for making |
| JP4951925B2 (ja) * | 2005-10-11 | 2012-06-13 | トヨタ自動車株式会社 | 燃料電池用ガスセパレータおよび燃料電池 |
| JP2014135435A (ja) * | 2013-01-11 | 2014-07-24 | Toshiba Corp | 半導体装置の製造方法 |
-
1972
- 1972-07-20 US US00273560A patent/US3814641A/en not_active Expired - Lifetime
-
1973
- 1973-07-19 JP JP8252873A patent/JPS5641989B2/ja not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| US3814641A (en) | 1974-06-04 |
| JPS4953380A (enExample) | 1974-05-23 |