JPS5641700B2 - - Google Patents
Info
- Publication number
- JPS5641700B2 JPS5641700B2 JP10525576A JP10525576A JPS5641700B2 JP S5641700 B2 JPS5641700 B2 JP S5641700B2 JP 10525576 A JP10525576 A JP 10525576A JP 10525576 A JP10525576 A JP 10525576A JP S5641700 B2 JPS5641700 B2 JP S5641700B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/18—Acidic compositions for etching copper or alloys thereof
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23F—NON-MECHANICAL REMOVAL OF METALLIC MATERIAL FROM SURFACE; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL; MULTI-STEP PROCESSES FOR SURFACE TREATMENT OF METALLIC MATERIAL INVOLVING AT LEAST ONE PROCESS PROVIDED FOR IN CLASS C23 AND AT LEAST ONE PROCESS COVERED BY SUBCLASS C21D OR C22F OR CLASS C25
- C23F1/00—Etching metallic material by chemical means
- C23F1/10—Etching compositions
- C23F1/14—Aqueous compositions
- C23F1/16—Acidic compositions
- C23F1/28—Acidic compositions for etching iron group metals
Landscapes
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- General Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Materials Engineering (AREA)
- Mechanical Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- ing And Chemical Polishing (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10525576A JPS5330435A (en) | 1976-09-02 | 1976-09-02 | Etching liquid |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP10525576A JPS5330435A (en) | 1976-09-02 | 1976-09-02 | Etching liquid |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5330435A JPS5330435A (en) | 1978-03-22 |
JPS5641700B2 true JPS5641700B2 (US07714131-20100511-C00038.png) | 1981-09-30 |
Family
ID=14402533
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP10525576A Granted JPS5330435A (en) | 1976-09-02 | 1976-09-02 | Etching liquid |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5330435A (US07714131-20100511-C00038.png) |
Families Citing this family (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2923524B2 (ja) * | 1995-08-01 | 1999-07-26 | メック株式会社 | 銅および銅合金のマイクロエッチング剤並びにマイクロエッチング方法 |
US6746547B2 (en) * | 2002-03-05 | 2004-06-08 | Rd Chemical Company | Methods and compositions for oxide production on copper |
ATE482303T1 (de) | 2005-10-25 | 2010-10-15 | Atotech Deutschland Gmbh | Zusammensetzung und verfahren zur haftfähigkeitsverbesserung der polymerischen materialien auf kupfer- oder kupferlegierungsoberflächen |
JP5398549B2 (ja) | 2008-01-15 | 2014-01-29 | 三菱製紙株式会社 | 銅または銅合金用のエッチング液、エッチング前処理液およびエッチング方法 |
EP2241653B1 (en) * | 2009-04-15 | 2017-09-06 | ATOTECH Deutschland GmbH | Composition and method for micro etching of copper and copper alloys |
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1976
- 1976-09-02 JP JP10525576A patent/JPS5330435A/ja active Granted
Also Published As
Publication number | Publication date |
---|---|
JPS5330435A (en) | 1978-03-22 |