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Filing date
Publication date
Application filedfiledCritical
Priority to JP5733878ApriorityCriticalpatent/JPS54148483A/ja
Publication of JPS54148483ApublicationCriticalpatent/JPS54148483A/ja
Publication of JPS5637694B2publicationCriticalpatent/JPS5637694B2/ja
H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
H01J37/3045—Object or beam position registration
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Chemical & Material Sciences
(AREA)
Analytical Chemistry
(AREA)
Exposure And Positioning Against Photoresist Photosensitive Materials
(AREA)
Electron Beam Exposure
(AREA)
Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure
(AREA)
JP5733878A1978-05-151978-05-15Automatic detecting method for reference mark of exposure
GrantedJPS54148483A
(en)