JPS5630849B2 - - Google Patents

Info

Publication number
JPS5630849B2
JPS5630849B2 JP443774A JP443774A JPS5630849B2 JP S5630849 B2 JPS5630849 B2 JP S5630849B2 JP 443774 A JP443774 A JP 443774A JP 443774 A JP443774 A JP 443774A JP S5630849 B2 JPS5630849 B2 JP S5630849B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP443774A
Other languages
Japanese (ja)
Other versions
JPS49126403A (cs
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS49126403A publication Critical patent/JPS49126403A/ja
Publication of JPS5630849B2 publication Critical patent/JPS5630849B2/ja
Expired legal-status Critical Current

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/022Quinonediazides
    • G03F7/023Macromolecular quinonediazides; Macromolecular additives, e.g. binders
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08FMACROMOLECULAR COMPOUNDS OBTAINED BY REACTIONS ONLY INVOLVING CARBON-TO-CARBON UNSATURATED BONDS
    • C08F8/00Chemical modification by after-treatment

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Chemical & Material Sciences (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Physics & Mathematics (AREA)
  • Addition Polymer Or Copolymer, Post-Treatments, Or Chemical Modifications (AREA)
  • Polymerisation Methods In General (AREA)
  • Photosensitive Polymer And Photoresist Processing (AREA)
JP443774A 1972-12-22 1973-12-22 Expired JPS5630849B2 (cs)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
US31758572A 1972-12-22 1972-12-22

Publications (2)

Publication Number Publication Date
JPS49126403A JPS49126403A (cs) 1974-12-04
JPS5630849B2 true JPS5630849B2 (cs) 1981-07-17

Family

ID=23234356

Family Applications (1)

Application Number Title Priority Date Filing Date
JP443774A Expired JPS5630849B2 (cs) 1972-12-22 1973-12-22

Country Status (6)

Country Link
JP (1) JPS5630849B2 (cs)
BE (1) BE809031A (cs)
CA (1) CA1005673A (cs)
FR (1) FR2211677B1 (cs)
GB (1) GB1442797A (cs)
IT (1) IT1000552B (cs)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4491628A (en) * 1982-08-23 1985-01-01 International Business Machines Corporation Positive- and negative-working resist compositions with acid generating photoinitiator and polymer with acid labile groups pendant from polymer backbone
JPS61206293A (ja) * 1985-03-08 1986-09-12 日本ペイント株式会社 回路板の製造方法
US4732836A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
US5035976A (en) * 1986-05-02 1991-07-30 Hoechst Celanese Corporation Photosensitive article having phenolic photosensitizers containing quinone diazide and acid halide substituents
US4732837A (en) * 1986-05-02 1988-03-22 Hoechst Celanese Corporation Novel mixed ester O-quinone photosensitizers
EP0287212B1 (en) * 1987-03-12 1994-12-28 Mitsubishi Chemical Corporation Positive photosensitive planographic printing plate
DE3731439A1 (de) * 1987-09-18 1989-03-30 Hoechst Ag Strahlungsempfindliches gemisch und hieraus hergestelltes kopiermaterial
JPH07119374B2 (ja) * 1987-11-06 1995-12-20 関西ペイント株式会社 ポジ型感光性カチオン電着塗料組成物

Also Published As

Publication number Publication date
CA1005673A (en) 1977-02-22
DE2364178A1 (de) 1974-07-11
IT1000552B (it) 1976-04-10
FR2211677A1 (cs) 1974-07-19
JPS49126403A (cs) 1974-12-04
GB1442797A (en) 1976-07-14
FR2211677B1 (cs) 1977-08-12
BE809031A (fr) 1974-06-21
DE2364178B2 (de) 1976-01-15

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