JPS5625731A - Positive type photoresist composition - Google Patents
Positive type photoresist compositionInfo
- Publication number
- JPS5625731A JPS5625731A JP10029779A JP10029779A JPS5625731A JP S5625731 A JPS5625731 A JP S5625731A JP 10029779 A JP10029779 A JP 10029779A JP 10029779 A JP10029779 A JP 10029779A JP S5625731 A JPS5625731 A JP S5625731A
- Authority
- JP
- Japan
- Prior art keywords
- polycondensate
- positive type
- photoresist composition
- type photoresist
- salicylaldehyde
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 229920002120 photoresistant polymer Polymers 0.000 title abstract 2
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 abstract 2
- -1 quinone diazidosulfonic acid ester Chemical class 0.000 abstract 2
- 229920005989 resin Polymers 0.000 abstract 2
- 239000011347 resin Substances 0.000 abstract 2
- 239000002904 solvent Substances 0.000 abstract 2
- WOAHJDHKFWSLKE-UHFFFAOYSA-N 1,2-benzoquinone Chemical compound O=C1C=CC=CC1=O WOAHJDHKFWSLKE-UHFFFAOYSA-N 0.000 abstract 1
- KETQAJRQOHHATG-UHFFFAOYSA-N 1,2-naphthoquinone Chemical compound C1=CC=C2C(=O)C(=O)C=CC2=C1 KETQAJRQOHHATG-UHFFFAOYSA-N 0.000 abstract 1
- GEYOCULIXLDCMW-UHFFFAOYSA-N 1,2-phenylenediamine Chemical compound NC1=CC=CC=C1N GEYOCULIXLDCMW-UHFFFAOYSA-N 0.000 abstract 1
- OWPBOKWFRAIKTD-UHFFFAOYSA-N 5-[(3-formyl-4-hydroxyphenyl)methyl]-2-hydroxybenzaldehyde Chemical compound C1=C(C=O)C(O)=CC=C1CC1=CC=C(O)C(C=O)=C1 OWPBOKWFRAIKTD-UHFFFAOYSA-N 0.000 abstract 1
- 229960000583 acetic acid Drugs 0.000 abstract 1
- SLGWESQGEUXWJQ-UHFFFAOYSA-N formaldehyde;phenol Chemical compound O=C.OC1=CC=CC=C1 SLGWESQGEUXWJQ-UHFFFAOYSA-N 0.000 abstract 1
- 239000012362 glacial acetic acid Substances 0.000 abstract 1
- 238000002156 mixing Methods 0.000 abstract 1
- 229920003986 novolac Polymers 0.000 abstract 1
- AZQWKYJCGOJGHM-UHFFFAOYSA-N para-benzoquinone Natural products O=C1C=CC(=O)C=C1 AZQWKYJCGOJGHM-UHFFFAOYSA-N 0.000 abstract 1
- 229920001568 phenolic resin Polymers 0.000 abstract 1
- 239000000758 substrate Substances 0.000 abstract 1
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/022—Quinonediazides
- G03F7/023—Macromolecular quinonediazides; Macromolecular additives, e.g. binders
- G03F7/0233—Macromolecular quinonediazides; Macromolecular additives, e.g. binders characterised by the polymeric binders or the macromolecular additives other than the macromolecular quinonediazides
Landscapes
- Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Physics & Mathematics (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10029779A JPS5625731A (en) | 1979-08-08 | 1979-08-08 | Positive type photoresist composition |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP10029779A JPS5625731A (en) | 1979-08-08 | 1979-08-08 | Positive type photoresist composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5625731A true JPS5625731A (en) | 1981-03-12 |
| JPS6352371B2 JPS6352371B2 (enrdf_load_stackoverflow) | 1988-10-18 |
Family
ID=14270228
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10029779A Granted JPS5625731A (en) | 1979-08-08 | 1979-08-08 | Positive type photoresist composition |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5625731A (enrdf_load_stackoverflow) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020012030A (ja) * | 2018-07-13 | 2020-01-23 | 群栄化学工業株式会社 | 紫外線吸収剤、紫外線吸収性樹脂、紫外線吸収性樹脂組成物、ワニス、紫外線吸収性フィルム及びその製造方法 |
-
1979
- 1979-08-08 JP JP10029779A patent/JPS5625731A/ja active Granted
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP2020012030A (ja) * | 2018-07-13 | 2020-01-23 | 群栄化学工業株式会社 | 紫外線吸収剤、紫外線吸収性樹脂、紫外線吸収性樹脂組成物、ワニス、紫外線吸収性フィルム及びその製造方法 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6352371B2 (enrdf_load_stackoverflow) | 1988-10-18 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| EP0718693A3 (en) | Photoresist compositions and components | |
| MY103006A (en) | Photoresist compositions | |
| JPS5314800A (en) | Curable resin composition | |
| EP0919867A3 (de) | Chemisch verstärkter Resist für die Elektronenstrahllithographie | |
| JPS51146534A (en) | Powder coating composition | |
| JPS5281885A (en) | Structure for preventing steps from floating | |
| FR2375296A1 (fr) | Composition moussable de poly(oxyde de phenylene) | |
| JPS5625731A (en) | Positive type photoresist composition | |
| EP0285025A3 (en) | Silylated poly(vinyl)phenol resists | |
| JPS5625730A (en) | Positive type photoresist composition | |
| FR2299367A1 (fr) | Composition vulcanisable a base d'un caoutchouc de polybutadiene brome | |
| JPS57120931A (en) | Positive type photosensitive resin composition | |
| JPS51138739A (en) | Ri gid halogen containing resin composition | |
| JPS5356232A (en) | Latex-type adhesive compositions | |
| DE3867929D1 (de) | Lichtempfindliche 1,2-naphthochinondiazid-4-sulfonsaeuremonoester und lichtempfindliche zusammensetzungen damit. | |
| JPS5313696A (en) | Solventless and curable composition | |
| JPS51120712A (en) | Positive type photo-resistant compound | |
| JPS5229067A (en) | Code plate | |
| JPS51130192A (en) | The process of manufacture for illminative optical solid display sabst ace | |
| JPS5229851A (en) | Epoxy resin composition for press molding and its preparation | |
| JPS5259576A (en) | Semiconductor device | |
| JPS51124150A (en) | Plasticized ring-opening polymer compositions | |
| JPS5697341A (en) | Photosensitive composition | |
| JPS5244898A (en) | Preparation of polyester | |
| GB1392236A (en) | Photosensitive compositions |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| R250 | Receipt of annual fees |
Free format text: JAPANESE INTERMEDIATE CODE: R250 |
|
| LAPS | Cancellation because of no payment of annual fees |