JPS5625017B2 - - Google Patents
Info
- Publication number
- JPS5625017B2 JPS5625017B2 JP14976476A JP14976476A JPS5625017B2 JP S5625017 B2 JPS5625017 B2 JP S5625017B2 JP 14976476 A JP14976476 A JP 14976476A JP 14976476 A JP14976476 A JP 14976476A JP S5625017 B2 JPS5625017 B2 JP S5625017B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Drying Of Semiconductors (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14976476A JPS5374379A (en) | 1976-12-15 | 1976-12-15 | Correction filter for illuminance distribution |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP14976476A JPS5374379A (en) | 1976-12-15 | 1976-12-15 | Correction filter for illuminance distribution |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5374379A JPS5374379A (en) | 1978-07-01 |
| JPS5625017B2 true JPS5625017B2 (en) | 1981-06-10 |
Family
ID=15482218
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP14976476A Granted JPS5374379A (en) | 1976-12-15 | 1976-12-15 | Correction filter for illuminance distribution |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS5374379A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0319087B2 (en) * | 1982-08-23 | 1991-03-14 | Nissan Shatai Co | |
| JPH0762503B2 (en) * | 1987-04-14 | 1995-07-05 | ジーメンス アクチエンゲゼルシヤフト | Dynamic energy absorber |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS6325640A (en) * | 1986-07-18 | 1988-02-03 | Oak Seisakusho:Kk | Optical system for projecting parallel light |
| US20180299792A1 (en) * | 2015-06-02 | 2018-10-18 | Asml Netherlands B.V. | Filter, method of formation thereof, and image sensor |
-
1976
- 1976-12-15 JP JP14976476A patent/JPS5374379A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0319087B2 (en) * | 1982-08-23 | 1991-03-14 | Nissan Shatai Co | |
| JPH0762503B2 (en) * | 1987-04-14 | 1995-07-05 | ジーメンス アクチエンゲゼルシヤフト | Dynamic energy absorber |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS5374379A (en) | 1978-07-01 |