JPS562408B2 - - Google Patents
Info
- Publication number
- JPS562408B2 JPS562408B2 JP4247578A JP4247578A JPS562408B2 JP S562408 B2 JPS562408 B2 JP S562408B2 JP 4247578 A JP4247578 A JP 4247578A JP 4247578 A JP4247578 A JP 4247578A JP S562408 B2 JPS562408 B2 JP S562408B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4247578A JPS54134565A (en) | 1978-04-10 | 1978-04-10 | Production of semiconductor device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP4247578A JPS54134565A (en) | 1978-04-10 | 1978-04-10 | Production of semiconductor device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS54134565A JPS54134565A (en) | 1979-10-19 |
| JPS562408B2 true JPS562408B2 (enrdf_load_stackoverflow) | 1981-01-20 |
Family
ID=12637077
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP4247578A Granted JPS54134565A (en) | 1978-04-10 | 1978-04-10 | Production of semiconductor device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS54134565A (enrdf_load_stackoverflow) |
Families Citing this family (11)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPH0120076Y2 (enrdf_load_stackoverflow) * | 1981-05-11 | 1989-06-12 | ||
| DE3175280D1 (en) * | 1981-12-21 | 1986-10-09 | Burroughs Corp | Improvement in and relating to the manufacture of wafer scale integrated circuits |
| US4883359A (en) * | 1984-02-28 | 1989-11-28 | Canon Kabushiki Kaisha | Alignment method and pattern forming method using the same |
| US4878086A (en) * | 1985-04-01 | 1989-10-31 | Canon Kabushiki Kaisha | Flat panel display device and manufacturing of the same |
| US4814830A (en) * | 1985-04-01 | 1989-03-21 | Canon Kabushiki Kaisha | Flat panel display device and manufacturing of the same |
| JPH0622192B2 (ja) * | 1985-04-25 | 1994-03-23 | キヤノン株式会社 | 表示パネル製造方法 |
| JPS6247129A (ja) * | 1985-08-26 | 1987-02-28 | Fujitsu Ltd | 半導体装置の製造方法 |
| EP0227851B1 (de) * | 1985-12-21 | 1991-02-27 | Ibm Deutschland Gmbh | Verfahren zum Herstellen eines Photolackmusters |
| JPS62147728A (ja) * | 1985-12-23 | 1987-07-01 | Fujitsu Ltd | 露光方法 |
| JP2503572B2 (ja) * | 1988-03-08 | 1996-06-05 | 株式会社ニコン | 露光装置及び露光方法 |
| JPH03116714A (ja) * | 1989-09-28 | 1991-05-17 | Nec Ic Microcomput Syst Ltd | 半導体集積回路素子の製造方法 |
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1978
- 1978-04-10 JP JP4247578A patent/JPS54134565A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS54134565A (en) | 1979-10-19 |