JPS5616367B1 - - Google Patents

Info

Publication number
JPS5616367B1
JPS5616367B1 JP3650372A JP3650372A JPS5616367B1 JP S5616367 B1 JPS5616367 B1 JP S5616367B1 JP 3650372 A JP3650372 A JP 3650372A JP 3650372 A JP3650372 A JP 3650372A JP S5616367 B1 JPS5616367 B1 JP S5616367B1
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP3650372A
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Publication of JPS5616367B1 publication Critical patent/JPS5616367B1/ja
Pending legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/32—Gas-filled discharge tubes
    • H01J37/34—Gas-filled discharge tubes operating with cathodic sputtering
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J2237/00—Discharge tubes exposing object to beam, e.g. for analysis treatment, etching, imaging
    • H01J2237/30—Electron or ion beam tubes for processing objects
    • H01J2237/31—Processing objects on a macro-scale
    • H01J2237/3151—Etching

Landscapes

  • Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Plasma & Fusion (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Sampling And Sample Adjustment (AREA)
  • Analysing Materials By The Use Of Radiation (AREA)
JP3650372A 1971-06-21 1972-04-13 Pending JPS5616367B1 (ja)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
DE2130605A DE2130605C3 (de) 1971-06-21 1971-06-21 Sontrastierungsverfahren für mikroskopisch zu untersuchende Objekte

Publications (1)

Publication Number Publication Date
JPS5616367B1 true JPS5616367B1 (ja) 1981-04-16

Family

ID=5811289

Family Applications (1)

Application Number Title Priority Date Filing Date
JP3650372A Pending JPS5616367B1 (ja) 1971-06-21 1972-04-13

Country Status (8)

Country Link
US (1) US3859535A (ja)
JP (1) JPS5616367B1 (ja)
AT (1) AT336306B (ja)
CH (1) CH541137A (ja)
DE (1) DE2130605C3 (ja)
FR (1) FR2142998B1 (ja)
GB (1) GB1353424A (ja)
SE (1) SE375381B (ja)

Families Citing this family (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE2433690C2 (de) * 1974-07-12 1984-04-26 Kernforschungszentrum Karlsruhe Gmbh, 7500 Karlsruhe Vorrichtung zur Oberflächenbehandlung einer metallographischen Probe
US4307283A (en) * 1979-09-27 1981-12-22 Eaton Corporation Plasma etching apparatus II-conical-shaped projection
US4614639A (en) * 1985-04-26 1986-09-30 Tegal Corporation Compound flow plasma reactor
US4915917A (en) * 1987-02-19 1990-04-10 The Johns Hopkins University Glow discharge unit
US5148714A (en) * 1990-10-24 1992-09-22 Ag Processing Technology, Inc. Rotary/linear actuator for closed chamber, and reaction chamber utilizing same

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US2200909A (en) * 1937-11-30 1940-05-14 Berghaus Metallization of metal articles by cathode disintegration
US3308049A (en) * 1963-03-06 1967-03-07 Gen Electric Glow discharge apparatus for treating workpieces
US3418229A (en) * 1965-06-30 1968-12-24 Weston Instruments Inc Method of forming films of compounds having at least two anions by cathode sputtering
US3477936A (en) * 1967-06-29 1969-11-11 Ppg Industries Inc Sputtering of metals in an atmosphere of fluorine and oxygen
US3604970A (en) * 1968-10-14 1971-09-14 Varian Associates Nonelectron emissive electrode structure utilizing ion-plated nonemissive coatings
US3704216A (en) * 1969-09-11 1972-11-28 Texas Instruments Inc Method of depositing a metal oxide film by electron bombardment
US3650930A (en) * 1969-10-27 1972-03-21 Gen Electric Glow discharge masking process

Also Published As

Publication number Publication date
DE2130605B2 (de) 1973-07-19
FR2142998B1 (ja) 1973-07-13
ATA491772A (de) 1976-08-15
DE2130605C3 (de) 1974-02-07
DE2130605A1 (de) 1973-01-11
CH541137A (de) 1973-08-31
SE375381B (ja) 1975-04-14
US3859535A (en) 1975-01-07
FR2142998A1 (ja) 1973-02-02
GB1353424A (en) 1974-05-15
AT336306B (de) 1977-04-25

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