JPS56140451U - - Google Patents
Info
- Publication number
- JPS56140451U JPS56140451U JP3981080U JP3981080U JPS56140451U JP S56140451 U JPS56140451 U JP S56140451U JP 3981080 U JP3981080 U JP 3981080U JP 3981080 U JP3981080 U JP 3981080U JP S56140451 U JPS56140451 U JP S56140451U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Accessory Devices And Overall Control Thereof (AREA)
- Controlling Sheets Or Webs (AREA)
- Controlling Rewinding, Feeding, Winding, Or Abnormalities Of Webs (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1980039810U JPS63450Y2 (en:Method) | 1980-03-26 | 1980-03-26 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1980039810U JPS63450Y2 (en:Method) | 1980-03-26 | 1980-03-26 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56140451U true JPS56140451U (en:Method) | 1981-10-23 |
| JPS63450Y2 JPS63450Y2 (en:Method) | 1988-01-07 |
Family
ID=29635249
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1980039810U Expired JPS63450Y2 (en:Method) | 1980-03-26 | 1980-03-26 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS63450Y2 (en:Method) |
Families Citing this family (6)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US7166200B2 (en) | 2002-09-30 | 2007-01-23 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate in a plasma processing system |
| US7147749B2 (en) | 2002-09-30 | 2006-12-12 | Tokyo Electron Limited | Method and apparatus for an improved upper electrode plate with deposition shield in a plasma processing system |
| CN1249789C (zh) | 2002-11-28 | 2006-04-05 | 东京毅力科创株式会社 | 等离子体处理容器内部件 |
| US7560376B2 (en) | 2003-03-31 | 2009-07-14 | Tokyo Electron Limited | Method for adjoining adjacent coatings on a processing element |
| US7552521B2 (en) | 2004-12-08 | 2009-06-30 | Tokyo Electron Limited | Method and apparatus for improved baffle plate |
| US7601242B2 (en) | 2005-01-11 | 2009-10-13 | Tokyo Electron Limited | Plasma processing system and baffle assembly for use in plasma processing system |
Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53142812U (en:Method) * | 1977-04-18 | 1978-11-11 | ||
| JPS546496U (en:Method) * | 1977-06-17 | 1979-01-17 | ||
| JPS54103910U (en:Method) * | 1977-12-28 | 1979-07-21 |
-
1980
- 1980-03-26 JP JP1980039810U patent/JPS63450Y2/ja not_active Expired
Patent Citations (3)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS53142812U (en:Method) * | 1977-04-18 | 1978-11-11 | ||
| JPS546496U (en:Method) * | 1977-06-17 | 1979-01-17 | ||
| JPS54103910U (en:Method) * | 1977-12-28 | 1979-07-21 |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS63450Y2 (en:Method) | 1988-01-07 |