JPS56139533U - - Google Patents
Info
- Publication number
- JPS56139533U JPS56139533U JP1980038077U JP3807780U JPS56139533U JP S56139533 U JPS56139533 U JP S56139533U JP 1980038077 U JP1980038077 U JP 1980038077U JP 3807780 U JP3807780 U JP 3807780U JP S56139533 U JPS56139533 U JP S56139533U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Making Paper Articles (AREA)
- Pile Receivers (AREA)
Priority Applications (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1980038077U JPS6116113Y2 (enrdf_load_stackoverflow) | 1980-03-21 | 1980-03-21 |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP1980038077U JPS6116113Y2 (enrdf_load_stackoverflow) | 1980-03-21 | 1980-03-21 |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS56139533U true JPS56139533U (enrdf_load_stackoverflow) | 1981-10-22 |
JPS6116113Y2 JPS6116113Y2 (enrdf_load_stackoverflow) | 1986-05-19 |
Family
ID=29633611
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP1980038077U Expired JPS6116113Y2 (enrdf_load_stackoverflow) | 1980-03-21 | 1980-03-21 |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS6116113Y2 (enrdf_load_stackoverflow) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6838124B2 (en) | 1999-10-18 | 2005-01-04 | Honeywell International Inc. | Deposition of fluorosilsesquioxane films |
US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
-
1980
- 1980-03-21 JP JP1980038077U patent/JPS6116113Y2/ja not_active Expired
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6838124B2 (en) | 1999-10-18 | 2005-01-04 | Honeywell International Inc. | Deposition of fluorosilsesquioxane films |
US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
Also Published As
Publication number | Publication date |
---|---|
JPS6116113Y2 (enrdf_load_stackoverflow) | 1986-05-19 |