JPS56139533U - - Google Patents
Info
- Publication number
- JPS56139533U JPS56139533U JP1980038077U JP3807780U JPS56139533U JP S56139533 U JPS56139533 U JP S56139533U JP 1980038077 U JP1980038077 U JP 1980038077U JP 3807780 U JP3807780 U JP 3807780U JP S56139533 U JPS56139533 U JP S56139533U
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Landscapes
- Pile Receivers (AREA)
- Making Paper Articles (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1980038077U JPS6116113Y2 (cg-RX-API-DMAC7.html) | 1980-03-21 | 1980-03-21 |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP1980038077U JPS6116113Y2 (cg-RX-API-DMAC7.html) | 1980-03-21 | 1980-03-21 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS56139533U true JPS56139533U (cg-RX-API-DMAC7.html) | 1981-10-22 |
| JPS6116113Y2 JPS6116113Y2 (cg-RX-API-DMAC7.html) | 1986-05-19 |
Family
ID=29633611
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP1980038077U Expired JPS6116113Y2 (cg-RX-API-DMAC7.html) | 1980-03-21 | 1980-03-21 |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS6116113Y2 (cg-RX-API-DMAC7.html) |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6838124B2 (en) | 1999-10-18 | 2005-01-04 | Honeywell International Inc. | Deposition of fluorosilsesquioxane films |
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
-
1980
- 1980-03-21 JP JP1980038077U patent/JPS6116113Y2/ja not_active Expired
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US6838124B2 (en) | 1999-10-18 | 2005-01-04 | Honeywell International Inc. | Deposition of fluorosilsesquioxane films |
| US6914114B2 (en) | 2000-07-17 | 2005-07-05 | Honeywell International Inc. | Absorbing compounds for spin-on-glass anti-reflective coatings for photolithography |
| US8992806B2 (en) | 2003-11-18 | 2015-03-31 | Honeywell International Inc. | Antireflective coatings for via fill and photolithography applications and methods of preparation thereof |
| US8864898B2 (en) | 2011-05-31 | 2014-10-21 | Honeywell International Inc. | Coating formulations for optical elements |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS6116113Y2 (cg-RX-API-DMAC7.html) | 1986-05-19 |