JPS56138925A - Manufacture of semiconductor device - Google Patents

Manufacture of semiconductor device

Info

Publication number
JPS56138925A
JPS56138925A JP4179380A JP4179380A JPS56138925A JP S56138925 A JPS56138925 A JP S56138925A JP 4179380 A JP4179380 A JP 4179380A JP 4179380 A JP4179380 A JP 4179380A JP S56138925 A JPS56138925 A JP S56138925A
Authority
JP
Japan
Prior art keywords
electron beam
chip
wafer
region
schedule
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP4179380A
Other languages
English (en)
Japanese (ja)
Other versions
JPS6333293B2 (cg-RX-API-DMAC7.html
Inventor
Hisashi Sugiyama
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Original Assignee
CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by CHIYOU LSI GIJUTSU KENKYU KUMIAI filed Critical CHIYOU LSI GIJUTSU KENKYU KUMIAI
Priority to JP4179380A priority Critical patent/JPS56138925A/ja
Publication of JPS56138925A publication Critical patent/JPS56138925A/ja
Publication of JPS6333293B2 publication Critical patent/JPS6333293B2/ja
Granted legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals

Landscapes

  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Electron Beam Exposure (AREA)
JP4179380A 1980-03-31 1980-03-31 Manufacture of semiconductor device Granted JPS56138925A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP4179380A JPS56138925A (en) 1980-03-31 1980-03-31 Manufacture of semiconductor device

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP4179380A JPS56138925A (en) 1980-03-31 1980-03-31 Manufacture of semiconductor device

Publications (2)

Publication Number Publication Date
JPS56138925A true JPS56138925A (en) 1981-10-29
JPS6333293B2 JPS6333293B2 (cg-RX-API-DMAC7.html) 1988-07-05

Family

ID=12618208

Family Applications (1)

Application Number Title Priority Date Filing Date
JP4179380A Granted JPS56138925A (en) 1980-03-31 1980-03-31 Manufacture of semiconductor device

Country Status (1)

Country Link
JP (1) JPS56138925A (cg-RX-API-DMAC7.html)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61144019A (ja) * 1984-12-17 1986-07-01 Jeol Ltd 電子ビーム露光装置のパターン・データ転送方法

Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4834352A (cg-RX-API-DMAC7.html) * 1971-09-07 1973-05-18
JPS542059A (en) * 1977-06-07 1979-01-09 Toshiba Corp Semiconductor wafer
JPS545665A (en) * 1977-06-15 1979-01-17 Fujitsu Ltd Electron beam exposure device
JPS55160429A (en) * 1979-05-31 1980-12-13 Jeol Ltd Method for electron beam exposure

Patent Citations (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4834352A (cg-RX-API-DMAC7.html) * 1971-09-07 1973-05-18
JPS542059A (en) * 1977-06-07 1979-01-09 Toshiba Corp Semiconductor wafer
JPS545665A (en) * 1977-06-15 1979-01-17 Fujitsu Ltd Electron beam exposure device
JPS55160429A (en) * 1979-05-31 1980-12-13 Jeol Ltd Method for electron beam exposure

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS61144019A (ja) * 1984-12-17 1986-07-01 Jeol Ltd 電子ビーム露光装置のパターン・データ転送方法

Also Published As

Publication number Publication date
JPS6333293B2 (cg-RX-API-DMAC7.html) 1988-07-05

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