JPS5611226B2 - - Google Patents

Info

Publication number
JPS5611226B2
JPS5611226B2 JP493473A JP493473A JPS5611226B2 JP S5611226 B2 JPS5611226 B2 JP S5611226B2 JP 493473 A JP493473 A JP 493473A JP 493473 A JP493473 A JP 493473A JP S5611226 B2 JPS5611226 B2 JP S5611226B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP493473A
Other languages
Japanese (ja)
Other versions
JPS4991783A (en, 2012
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP493473A priority Critical patent/JPS5611226B2/ja
Priority to GB5978673A priority patent/GB1422287A/en
Priority to US05/432,116 priority patent/US3938174A/en
Publication of JPS4991783A publication Critical patent/JPS4991783A/ja
Publication of JPS5611226B2 publication Critical patent/JPS5611226B2/ja
Expired legal-status Critical Current

Links

Classifications

    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/60Electrodes characterised by their materials
    • H10D64/66Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes
    • H10D64/661Electrodes having a conductor capacitively coupled to a semiconductor by an insulator, e.g. MIS electrodes the conductor comprising a layer of silicon contacting the insulator, e.g. polysilicon having vertical doping variation
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L23/00Details of semiconductor or other solid state devices
    • H01L23/52Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames
    • H01L23/522Arrangements for conducting electric current within the device in operation from one component to another, i.e. interconnections, e.g. wires, lead frames including external interconnections consisting of a multilayer structure of conductive and insulating layers inseparably formed on the semiconductor body
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D64/00Electrodes of devices having potential barriers
    • H10D64/20Electrodes characterised by their shapes, relative sizes or dispositions 
    • H10D64/27Electrodes not carrying the current to be rectified, amplified, oscillated or switched, e.g. gates
    • H10D64/311Gate electrodes for field-effect devices
    • H10D64/411Gate electrodes for field-effect devices for FETs
    • H10D64/511Gate electrodes for field-effect devices for FETs for IGFETs
    • H10D64/517Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers
    • H10D64/519Gate electrodes for field-effect devices for FETs for IGFETs characterised by the conducting layers characterised by their top-view geometrical layouts
    • HELECTRICITY
    • H10SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
    • H10DINORGANIC ELECTRIC SEMICONDUCTOR DEVICES
    • H10D99/00Subject matter not provided for in other groups of this subclass
    • HELECTRICITY
    • H01ELECTRIC ELEMENTS
    • H01LSEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001Technical content checked by a classifier
    • H01L2924/0002Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00

Landscapes

  • Physics & Mathematics (AREA)
  • Condensed Matter Physics & Semiconductors (AREA)
  • General Physics & Mathematics (AREA)
  • Engineering & Computer Science (AREA)
  • Computer Hardware Design (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Power Engineering (AREA)
  • Electrodes Of Semiconductors (AREA)
  • Element Separation (AREA)
  • Insulated Gate Type Field-Effect Transistor (AREA)
JP493473A 1973-01-09 1973-01-09 Expired JPS5611226B2 (en, 2012)

Priority Applications (3)

Application Number Priority Date Filing Date Title
JP493473A JPS5611226B2 (en, 2012) 1973-01-09 1973-01-09
GB5978673A GB1422287A (en) 1973-01-09 1973-12-27 Insulated gate transistor
US05/432,116 US3938174A (en) 1973-01-09 1974-01-09 Semiconductor integrated circuit and method of manufacture

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP493473A JPS5611226B2 (en, 2012) 1973-01-09 1973-01-09

Publications (2)

Publication Number Publication Date
JPS4991783A JPS4991783A (en, 2012) 1974-09-02
JPS5611226B2 true JPS5611226B2 (en, 2012) 1981-03-12

Family

ID=11597394

Family Applications (1)

Application Number Title Priority Date Filing Date
JP493473A Expired JPS5611226B2 (en, 2012) 1973-01-09 1973-01-09

Country Status (3)

Country Link
US (1) US3938174A (en, 2012)
JP (1) JPS5611226B2 (en, 2012)
GB (1) GB1422287A (en, 2012)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6173621U (en, 2012) * 1984-10-16 1986-05-19

Families Citing this family (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS51118969A (en) * 1975-04-11 1976-10-19 Fujitsu Ltd Manufacturing method of semiconductor memory
JPS54107268A (en) * 1978-02-10 1979-08-22 Toshiba Corp Integrated circuit unit and its production
GB2123605A (en) * 1982-06-22 1984-02-01 Standard Microsyst Smc MOS integrated circuit structure and method for its fabrication
US4811066A (en) * 1987-10-19 1989-03-07 Motorola, Inc. Compact multi-state ROM cell
JPH0389555A (ja) * 1989-09-01 1991-04-15 Hitachi Ltd 半導体装置及びその製法
US5644155A (en) * 1994-09-06 1997-07-01 Integrated Device Technology, Inc. Structure and fabrication of high capacitance insulated-gate field effect transistor

Family Cites Families (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3711753A (en) * 1971-06-04 1973-01-16 Signetics Corp Enhancement mode n-channel mos structure and method

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6173621U (en, 2012) * 1984-10-16 1986-05-19

Also Published As

Publication number Publication date
US3938174A (en) 1976-02-10
JPS4991783A (en, 2012) 1974-09-02
GB1422287A (en) 1976-01-21

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