JPS5610782B2 - - Google Patents
Info
- Publication number
- JPS5610782B2 JPS5610782B2 JP8206178A JP8206178A JPS5610782B2 JP S5610782 B2 JPS5610782 B2 JP S5610782B2 JP 8206178 A JP8206178 A JP 8206178A JP 8206178 A JP8206178 A JP 8206178A JP S5610782 B2 JPS5610782 B2 JP S5610782B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70408—Interferometric lithography; Holographic lithography; Self-imaging lithography, e.g. utilizing the Talbot effect
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Projection-Type Copiers In General (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Surface Acoustic Wave Elements And Circuit Networks Thereof (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8206178A JPS559429A (en) | 1978-07-07 | 1978-07-07 | Method of interdigital type pattern exposure |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8206178A JPS559429A (en) | 1978-07-07 | 1978-07-07 | Method of interdigital type pattern exposure |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS559429A JPS559429A (en) | 1980-01-23 |
| JPS5610782B2 true JPS5610782B2 (fr) | 1981-03-10 |
Family
ID=13763984
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8206178A Granted JPS559429A (en) | 1978-07-07 | 1978-07-07 | Method of interdigital type pattern exposure |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS559429A (fr) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018114301A1 (fr) | 2016-12-22 | 2018-06-28 | Unilever Plc | Contenant à coque conçu pour loger un contenant de recharge séparé |
Families Citing this family (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58154233A (ja) * | 1982-03-10 | 1983-09-13 | Agency Of Ind Science & Technol | 半導体材料の周期的エツチング方法 |
-
1978
- 1978-07-07 JP JP8206178A patent/JPS559429A/ja active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2018114301A1 (fr) | 2016-12-22 | 2018-06-28 | Unilever Plc | Contenant à coque conçu pour loger un contenant de recharge séparé |
| EP3936457A1 (fr) | 2016-12-22 | 2022-01-12 | Unilever IP Holdings B.V. | Un accessoire à combiner avec une fermeture |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS559429A (en) | 1980-01-23 |