JPS5598742A - Photosensitive resin film - Google Patents
Photosensitive resin filmInfo
- Publication number
- JPS5598742A JPS5598742A JP561479A JP561479A JPS5598742A JP S5598742 A JPS5598742 A JP S5598742A JP 561479 A JP561479 A JP 561479A JP 561479 A JP561479 A JP 561479A JP S5598742 A JPS5598742 A JP S5598742A
- Authority
- JP
- Japan
- Prior art keywords
- film
- polybutadiene
- composition
- photosensitizer
- photopolymerization initiator
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Abstract
PURPOSE: To enhance the image clearness and heat resistance of the resulting title film by forming a composition, into a film shape, consisting of cyclized polybutadiene, one or more out of a photocrosslinking agent, a photosensitizer and a photopolymerization initiator, and a shelf stabilizer.
CONSTITUTION: Cyclized polybutadiene, one or more out of a photocrosslinking agent, a photosensitizer and a photopolymerization initiator, and a shelf stabilizer are added to a solvent such as toluene optionally together with a dye or a pigment to form a uniform composition. The cyclized polybutadiene has a MW of about 30,000W300,000 with respect to starting material polybutadiene, a cyclization rate of about 40W70% and an intrinsic viscosity of about 0.3W0.7dl/g in toluene at 30°C. The composition is then coated onto a support such as a polytetrafluoroethylene film and dried to produce a dry film. After exfoliating the support as required, by means of heat, this dry film can easily be laminated onto a material to be processed.
COPYRIGHT: (C)1980,JPO&Japio
Priority Applications (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP561479A JPS5598742A (en) | 1979-01-23 | 1979-01-23 | Photosensitive resin film |
US06/169,464 US4330612A (en) | 1979-01-23 | 1980-07-16 | Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer |
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP561479A JPS5598742A (en) | 1979-01-23 | 1979-01-23 | Photosensitive resin film |
Publications (2)
Publication Number | Publication Date |
---|---|
JPS5598742A true JPS5598742A (en) | 1980-07-28 |
JPH0145052B2 JPH0145052B2 (en) | 1989-10-02 |
Family
ID=11616059
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP561479A Granted JPS5598742A (en) | 1979-01-23 | 1979-01-23 | Photosensitive resin film |
Country Status (1)
Country | Link |
---|---|
JP (1) | JPS5598742A (en) |
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5770531A (en) * | 1980-10-21 | 1982-05-01 | Japan Synthetic Rubber Co Ltd | Photoresist composition |
JPS5876829A (en) * | 1981-10-31 | 1983-05-10 | Toshiba Corp | Low molecular weight resist of high resolution |
JPS5940641A (en) * | 1982-08-31 | 1984-03-06 | Toshiba Corp | Negative type photoresist composition used for high resolution image |
Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5098318A (en) * | 1973-12-25 | 1975-08-05 | ||
JPS5114027A (en) * | 1974-07-25 | 1976-02-04 | Fuji Photo Film Co Ltd | DENKIEIDOGAZOKEISEIHO |
-
1979
- 1979-01-23 JP JP561479A patent/JPS5598742A/en active Granted
Patent Citations (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5098318A (en) * | 1973-12-25 | 1975-08-05 | ||
JPS5114027A (en) * | 1974-07-25 | 1976-02-04 | Fuji Photo Film Co Ltd | DENKIEIDOGAZOKEISEIHO |
Cited By (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS5770531A (en) * | 1980-10-21 | 1982-05-01 | Japan Synthetic Rubber Co Ltd | Photoresist composition |
JPS6340301B2 (en) * | 1980-10-21 | 1988-08-10 | Japan Synthetic Rubber Co Ltd | |
JPS5876829A (en) * | 1981-10-31 | 1983-05-10 | Toshiba Corp | Low molecular weight resist of high resolution |
JPS5940641A (en) * | 1982-08-31 | 1984-03-06 | Toshiba Corp | Negative type photoresist composition used for high resolution image |
JPH0544663B2 (en) * | 1982-08-31 | 1993-07-07 | Toshiba Kk |
Also Published As
Publication number | Publication date |
---|---|
JPH0145052B2 (en) | 1989-10-02 |
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