JPS5598742A - Photosensitive resin film - Google Patents

Photosensitive resin film

Info

Publication number
JPS5598742A
JPS5598742A JP561479A JP561479A JPS5598742A JP S5598742 A JPS5598742 A JP S5598742A JP 561479 A JP561479 A JP 561479A JP 561479 A JP561479 A JP 561479A JP S5598742 A JPS5598742 A JP S5598742A
Authority
JP
Japan
Prior art keywords
film
polybutadiene
composition
photosensitizer
photopolymerization initiator
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP561479A
Other languages
Japanese (ja)
Other versions
JPH0145052B2 (en
Inventor
Yoshiyuki Harita
Mitsuru Tashiro
Toko Harada
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
JSR Corp
Original Assignee
Japan Synthetic Rubber Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Japan Synthetic Rubber Co Ltd filed Critical Japan Synthetic Rubber Co Ltd
Priority to JP561479A priority Critical patent/JPS5598742A/en
Priority to US06/169,464 priority patent/US4330612A/en
Publication of JPS5598742A publication Critical patent/JPS5598742A/en
Publication of JPH0145052B2 publication Critical patent/JPH0145052B2/ja
Granted legal-status Critical Current

Links

Abstract

PURPOSE: To enhance the image clearness and heat resistance of the resulting title film by forming a composition, into a film shape, consisting of cyclized polybutadiene, one or more out of a photocrosslinking agent, a photosensitizer and a photopolymerization initiator, and a shelf stabilizer.
CONSTITUTION: Cyclized polybutadiene, one or more out of a photocrosslinking agent, a photosensitizer and a photopolymerization initiator, and a shelf stabilizer are added to a solvent such as toluene optionally together with a dye or a pigment to form a uniform composition. The cyclized polybutadiene has a MW of about 30,000W300,000 with respect to starting material polybutadiene, a cyclization rate of about 40W70% and an intrinsic viscosity of about 0.3W0.7dl/g in toluene at 30°C. The composition is then coated onto a support such as a polytetrafluoroethylene film and dried to produce a dry film. After exfoliating the support as required, by means of heat, this dry film can easily be laminated onto a material to be processed.
COPYRIGHT: (C)1980,JPO&Japio
JP561479A 1979-01-23 1979-01-23 Photosensitive resin film Granted JPS5598742A (en)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP561479A JPS5598742A (en) 1979-01-23 1979-01-23 Photosensitive resin film
US06/169,464 US4330612A (en) 1979-01-23 1980-07-16 Laminate of monolayer film of cyclized butadiene polymer and other photosensitive layer

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP561479A JPS5598742A (en) 1979-01-23 1979-01-23 Photosensitive resin film

Publications (2)

Publication Number Publication Date
JPS5598742A true JPS5598742A (en) 1980-07-28
JPH0145052B2 JPH0145052B2 (en) 1989-10-02

Family

ID=11616059

Family Applications (1)

Application Number Title Priority Date Filing Date
JP561479A Granted JPS5598742A (en) 1979-01-23 1979-01-23 Photosensitive resin film

Country Status (1)

Country Link
JP (1) JPS5598742A (en)

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5770531A (en) * 1980-10-21 1982-05-01 Japan Synthetic Rubber Co Ltd Photoresist composition
JPS5876829A (en) * 1981-10-31 1983-05-10 Toshiba Corp Low molecular weight resist of high resolution
JPS5940641A (en) * 1982-08-31 1984-03-06 Toshiba Corp Negative type photoresist composition used for high resolution image

Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5098318A (en) * 1973-12-25 1975-08-05
JPS5114027A (en) * 1974-07-25 1976-02-04 Fuji Photo Film Co Ltd DENKIEIDOGAZOKEISEIHO

Patent Citations (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5098318A (en) * 1973-12-25 1975-08-05
JPS5114027A (en) * 1974-07-25 1976-02-04 Fuji Photo Film Co Ltd DENKIEIDOGAZOKEISEIHO

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS5770531A (en) * 1980-10-21 1982-05-01 Japan Synthetic Rubber Co Ltd Photoresist composition
JPS6340301B2 (en) * 1980-10-21 1988-08-10 Japan Synthetic Rubber Co Ltd
JPS5876829A (en) * 1981-10-31 1983-05-10 Toshiba Corp Low molecular weight resist of high resolution
JPS5940641A (en) * 1982-08-31 1984-03-06 Toshiba Corp Negative type photoresist composition used for high resolution image
JPH0544663B2 (en) * 1982-08-31 1993-07-07 Toshiba Kk

Also Published As

Publication number Publication date
JPH0145052B2 (en) 1989-10-02

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