JPS559418A - Position detecting method - Google Patents
Position detecting methodInfo
- Publication number
- JPS559418A JPS559418A JP8158878A JP8158878A JPS559418A JP S559418 A JPS559418 A JP S559418A JP 8158878 A JP8158878 A JP 8158878A JP 8158878 A JP8158878 A JP 8158878A JP S559418 A JPS559418 A JP S559418A
- Authority
- JP
- Japan
- Prior art keywords
- mark
- detector
- frequency
- gates
- sample
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
- 238000010894 electron beam technology Methods 0.000 abstract 2
- 230000004044 response Effects 0.000 abstract 2
- 238000006073 displacement reaction Methods 0.000 abstract 1
- 230000011514 reflex Effects 0.000 abstract 1
Classifications
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
- H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
- H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
- H01J37/304—Controlling tubes by information coming from the objects or from the beam, e.g. correction signals
- H01J37/3045—Object or beam position registration
Landscapes
- Chemical & Material Sciences (AREA)
- Analytical Chemistry (AREA)
- Electron Beam Exposure (AREA)
Abstract
PURPOSE:To raise scanning cycle of an electron beam up to response frequency of a detector by picking up and detecting outputs coming independently with respect to each axis of coordinates from the detector during mark-scanning by the beam to which rotational motion is given. CONSTITUTION:A sample having a mark 11 is placed on a table 17 along two crossing axes. A pattern that is symmetrical to the crossing point of the axes is provided on the mark 11. Reflex electrons and the secondary electrons from the sample are detected by a detector 6, and detecting signals are transmitted from gates 13a and 13b only when the beam 2 scans the mark 11 in the X direction and the Y direction respectively. In this case, when the center of the mark is eccentric to the center of the circular motion of the electron beam 2, the outputs from the gates 13a and 13b have a wave pattern in which a long period and short period apear alternately, and frequency analizers 14a and 14b transmit signals with amplitudes corresponding to the displacements in the X and Y directions respectively. Therefore, response frequency of the detector 6 can exceed frequency of the circular motion of the beam 2.
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8158878A JPS559418A (en) | 1978-07-05 | 1978-07-05 | Position detecting method |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP8158878A JPS559418A (en) | 1978-07-05 | 1978-07-05 | Position detecting method |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS559418A true JPS559418A (en) | 1980-01-23 |
| JPS57643B2 JPS57643B2 (en) | 1982-01-07 |
Family
ID=13750469
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP8158878A Granted JPS559418A (en) | 1978-07-05 | 1978-07-05 | Position detecting method |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS559418A (en) |
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58500343A (en) * | 1981-03-03 | 1983-03-03 | ベ−コ インスツルメンツ インコ−ポレイテツド | Realignment system for charged particle beam exposure systems |
| US7057193B2 (en) | 2002-08-30 | 2006-06-06 | Canon Kabushiki Kaisha | Exposure apparatus |
-
1978
- 1978-07-05 JP JP8158878A patent/JPS559418A/en active Granted
Cited By (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS58500343A (en) * | 1981-03-03 | 1983-03-03 | ベ−コ インスツルメンツ インコ−ポレイテツド | Realignment system for charged particle beam exposure systems |
| US7057193B2 (en) | 2002-08-30 | 2006-06-06 | Canon Kabushiki Kaisha | Exposure apparatus |
Also Published As
| Publication number | Publication date |
|---|---|
| JPS57643B2 (en) | 1982-01-07 |
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