JPS5588334A - Mask for fabricating integrated circuit - Google Patents
Mask for fabricating integrated circuitInfo
- Publication number
- JPS5588334A JPS5588334A JP13304679A JP13304679A JPS5588334A JP S5588334 A JPS5588334 A JP S5588334A JP 13304679 A JP13304679 A JP 13304679A JP 13304679 A JP13304679 A JP 13304679A JP S5588334 A JPS5588334 A JP S5588334A
- Authority
- JP
- Japan
- Prior art keywords
- mask
- integrated circuit
- fabricating integrated
- fabricating
- circuit
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Pending
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
- G03F1/38—Masks having auxiliary features, e.g. special coatings or marks for alignment or testing; Preparation thereof
- G03F1/48—Protective coatings
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Preparing Plates And Mask In Photomechanical Process (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
DE19782845147 DE2845147B1 (de) | 1978-10-17 | 1978-10-17 | Projektionsmaske |
Publications (1)
Publication Number | Publication Date |
---|---|
JPS5588334A true JPS5588334A (en) | 1980-07-04 |
Family
ID=6052390
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
JP13304679A Pending JPS5588334A (en) | 1978-10-17 | 1979-10-17 | Mask for fabricating integrated circuit |
Country Status (2)
Country | Link |
---|---|
JP (1) | JPS5588334A (ja) |
DE (1) | DE2845147B1 (ja) |
Cited By (2)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61502080A (ja) * | 1984-05-03 | 1986-09-18 | アメリカン テレフオン アンド テレグラフ カムパニ− | 焦点面調節フォトマスクおよび感光性ワ−クピ−ス面上への像投映法 |
JPH05508487A (ja) * | 1991-05-17 | 1993-11-25 | デュポン・フォトマスクス・インコーポレイテッド | 圧力解放性ペリクル |
Families Citing this family (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US4361643A (en) * | 1981-01-05 | 1982-11-30 | Western Electric Co., Inc. | Photomask and method of using same |
-
1978
- 1978-10-17 DE DE19782845147 patent/DE2845147B1/de active Granted
-
1979
- 1979-10-17 JP JP13304679A patent/JPS5588334A/ja active Pending
Cited By (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JPS61502080A (ja) * | 1984-05-03 | 1986-09-18 | アメリカン テレフオン アンド テレグラフ カムパニ− | 焦点面調節フォトマスクおよび感光性ワ−クピ−ス面上への像投映法 |
JPH0549214B2 (ja) * | 1984-05-03 | 1993-07-23 | American Telephone & Telegraph | |
JPH05508487A (ja) * | 1991-05-17 | 1993-11-25 | デュポン・フォトマスクス・インコーポレイテッド | 圧力解放性ペリクル |
Also Published As
Publication number | Publication date |
---|---|
DE2845147B1 (de) | 1980-01-17 |
DE2845147C2 (ja) | 1980-09-11 |
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