JPS5566974A - Etching resist ink composition - Google Patents

Etching resist ink composition

Info

Publication number
JPS5566974A
JPS5566974A JP13991178A JP13991178A JPS5566974A JP S5566974 A JPS5566974 A JP S5566974A JP 13991178 A JP13991178 A JP 13991178A JP 13991178 A JP13991178 A JP 13991178A JP S5566974 A JPS5566974 A JP S5566974A
Authority
JP
Japan
Prior art keywords
rosin
dibenzylidene
parts
resin
sorbitol
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13991178A
Other languages
Japanese (ja)
Other versions
JPS5632346B2 (en
Inventor
Mitsuo Nakatani
Haruhiko Matsuyama
Takashi Kuroki
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13991178A priority Critical patent/JPS5566974A/en
Publication of JPS5566974A publication Critical patent/JPS5566974A/en
Publication of JPS5632346B2 publication Critical patent/JPS5632346B2/ja
Granted legal-status Critical Current

Links

Landscapes

  • Inks, Pencil-Leads, Or Crayons (AREA)
  • ing And Chemical Polishing (AREA)

Abstract

PURPOSE: To prepare an ink composition having excellent resistance to an etching liquid, and capable of being released and washed away after etching treatment, by mixing a mixture of a rosin-modified resin and rosin, with dibenzylidene-D-sorbitol and a solvent.
CONSTITUTION: A composition composed of (A) 100 parts by weight of a resin mixture containing (a) 50W95wt% of a rosin-modified phenolic resin and/or a rosin-modified maleic acid resin and (b) 5W50wt% of rosin, (B) 1W30 parts of dibenzylidene-D-sorbitol and/or dibenzylidene-D-sorbitol derivative, and (C) 15W45 parts of a solvent. When the amount of the rosin exceeds 50wt%, the resulting etching resist ink has only poor resistance to the etching liquid, and the releasing time by an alkaline solution becomes very long, and when it is less than 5wt%, the resistance to the etching liquid rapidly decreases.
COPYRIGHT: (C)1980,JPO&Japio
JP13991178A 1978-11-15 1978-11-15 Etching resist ink composition Granted JPS5566974A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13991178A JPS5566974A (en) 1978-11-15 1978-11-15 Etching resist ink composition

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13991178A JPS5566974A (en) 1978-11-15 1978-11-15 Etching resist ink composition

Publications (2)

Publication Number Publication Date
JPS5566974A true JPS5566974A (en) 1980-05-20
JPS5632346B2 JPS5632346B2 (en) 1981-07-27

Family

ID=15256499

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13991178A Granted JPS5566974A (en) 1978-11-15 1978-11-15 Etching resist ink composition

Country Status (1)

Country Link
JP (1) JPS5566974A (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4574057A (en) * 1984-05-29 1986-03-04 Neville Chemical Company Compositions for printing ink varnishes

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US4574057A (en) * 1984-05-29 1986-03-04 Neville Chemical Company Compositions for printing ink varnishes

Also Published As

Publication number Publication date
JPS5632346B2 (en) 1981-07-27

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