JPS5562794A - Method of regnerating printed circuit board surface cleanser - Google Patents

Method of regnerating printed circuit board surface cleanser

Info

Publication number
JPS5562794A
JPS5562794A JP13369878A JP13369878A JPS5562794A JP S5562794 A JPS5562794 A JP S5562794A JP 13369878 A JP13369878 A JP 13369878A JP 13369878 A JP13369878 A JP 13369878A JP S5562794 A JPS5562794 A JP S5562794A
Authority
JP
Japan
Prior art keywords
regnerating
circuit board
printed circuit
board surface
surface cleanser
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
JP13369878A
Other languages
Japanese (ja)
Other versions
JPS626678B2 (en
Inventor
Tatsuo Ite
Hajime Inoue
Shiyouji Oikawa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi Ltd
Original Assignee
Hitachi Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi Ltd filed Critical Hitachi Ltd
Priority to JP13369878A priority Critical patent/JPS5562794A/en
Publication of JPS5562794A publication Critical patent/JPS5562794A/en
Publication of JPS626678B2 publication Critical patent/JPS626678B2/ja
Granted legal-status Critical Current

Links

Classifications

    • C—CHEMISTRY; METALLURGY
    • C02—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F—TREATMENT OF WATER, WASTE WATER, SEWAGE, OR SLUDGE
    • C02F2103/00—Nature of the water, waste water, sewage or sludge to be treated
    • C02F2103/34—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32
    • C02F2103/346—Nature of the water, waste water, sewage or sludge to be treated from industrial activities not provided for in groups C02F2103/12 - C02F2103/32 from semiconductor processing, e.g. waste water from polishing of wafers

Landscapes

  • Manufacturing Of Printed Wiring (AREA)
JP13369878A 1978-11-01 1978-11-01 Method of regnerating printed circuit board surface cleanser Granted JPS5562794A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP13369878A JPS5562794A (en) 1978-11-01 1978-11-01 Method of regnerating printed circuit board surface cleanser

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP13369878A JPS5562794A (en) 1978-11-01 1978-11-01 Method of regnerating printed circuit board surface cleanser

Publications (2)

Publication Number Publication Date
JPS5562794A true JPS5562794A (en) 1980-05-12
JPS626678B2 JPS626678B2 (en) 1987-02-12

Family

ID=15110785

Family Applications (1)

Application Number Title Priority Date Filing Date
JP13369878A Granted JPS5562794A (en) 1978-11-01 1978-11-01 Method of regnerating printed circuit board surface cleanser

Country Status (1)

Country Link
JP (1) JPS5562794A (en)

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6372315A (en) * 1986-07-01 1988-04-02 デイジタル　イクイプメント　コ−ポレ−シヨン System for on-line filtering smear removal solution form smear removal tank
WO2000002819A1 (en) * 1998-07-10 2000-01-20 United States Filter Corporation Ion exchange removal of metal ions from wastewater
EP1078887A1 (en) * 1999-08-19 2001-02-28 Koch Microelectronic Service Company, Inc. A process for treating aqueous waste containing copper and copper CMP particles
EP1097368A1 (en) * 1998-07-13 2001-05-09 Nalco Chemical Company Detection and removal of copper from wastewater streams from semiconductor and printed circuit board processing
US7488423B2 (en) 2005-08-02 2009-02-10 Siemens Water Technologies Holding Corp. System and method of slurry treatment

Cited By (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6372315A (en) * 1986-07-01 1988-04-02 デイジタル　イクイプメント　コ−ポレ−シヨン System for on-line filtering smear removal solution form smear removal tank
JPS6411617A (en) * 1986-07-01 1989-01-17 Digital Equipment Corp On-line filtration of smear removing solution from smear removing tank
WO2000002819A1 (en) * 1998-07-10 2000-01-20 United States Filter Corporation Ion exchange removal of metal ions from wastewater
US6818129B2 (en) 1998-07-10 2004-11-16 Usfilter Corporation Ion exchange removal of metal ions from wastewater
EP1097368A1 (en) * 1998-07-13 2001-05-09 Nalco Chemical Company Detection and removal of copper from wastewater streams from semiconductor and printed circuit board processing
EP1097368A4 (en) * 1998-07-13 2002-04-10 Nalco Chemical Co Detection and removal of copper from wastewater streams from semiconductor and printed circuit board processing
EP1078887A1 (en) * 1999-08-19 2001-02-28 Koch Microelectronic Service Company, Inc. A process for treating aqueous waste containing copper and copper CMP particles
US7488423B2 (en) 2005-08-02 2009-02-10 Siemens Water Technologies Holding Corp. System and method of slurry treatment

Also Published As

Publication number Publication date
JPS626678B2 (en) 1987-02-12

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