JPS5546053B2 - - Google Patents
Info
- Publication number
- JPS5546053B2 JPS5546053B2 JP5281876A JP5281876A JPS5546053B2 JP S5546053 B2 JPS5546053 B2 JP S5546053B2 JP 5281876 A JP5281876 A JP 5281876A JP 5281876 A JP5281876 A JP 5281876A JP S5546053 B2 JPS5546053 B2 JP S5546053B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Landscapes
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Priority Applications (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5281876A JPS52136577A (en) | 1976-05-11 | 1976-05-11 | Aligning device |
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP5281876A JPS52136577A (en) | 1976-05-11 | 1976-05-11 | Aligning device |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS52136577A JPS52136577A (en) | 1977-11-15 |
| JPS5546053B2 true JPS5546053B2 (show.php) | 1980-11-21 |
Family
ID=12925411
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP5281876A Granted JPS52136577A (en) | 1976-05-11 | 1976-05-11 | Aligning device |
Country Status (1)
| Country | Link |
|---|---|
| JP (1) | JPS52136577A (show.php) |
Families Citing this family (5)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS54145478A (en) * | 1978-05-04 | 1979-11-13 | Nippon Telegr & Teleph Corp <Ntt> | Relative positioning method for wafer and exposure mask |
| JPS5729139U (show.php) * | 1981-04-30 | 1982-02-16 | ||
| JPS62115164A (ja) * | 1985-11-14 | 1987-05-26 | Hitachi Ltd | パタン形成方法およびその装置 |
| DE10355681A1 (de) * | 2003-11-28 | 2005-07-07 | Süss Microtec Lithography Gmbh | Direkte Justierung in Maskalignern |
| TW201015230A (en) * | 2008-10-03 | 2010-04-16 | Univ Nat Chiao Tung | Immersion inclined lithography apparatus and tank thereof |
Family Cites Families (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US3742229A (en) * | 1972-06-29 | 1973-06-26 | Massachusetts Inst Technology | Soft x-ray mask alignment system |
| DE2346719C3 (de) * | 1973-09-17 | 1980-01-24 | Siemens Ag, 1000 Berlin Und 8000 Muenchen | Mehrschichtige Bestrahlungsmaske für die Röntgenstrahl-Fotolithografie |
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1976
- 1976-05-11 JP JP5281876A patent/JPS52136577A/ja active Granted
Also Published As
| Publication number | Publication date |
|---|---|
| JPS52136577A (en) | 1977-11-15 |