JPS5545223U - - Google Patents

Info

Publication number
JPS5545223U
JPS5545223U JP12695978U JP12695978U JPS5545223U JP S5545223 U JPS5545223 U JP S5545223U JP 12695978 U JP12695978 U JP 12695978U JP 12695978 U JP12695978 U JP 12695978U JP S5545223 U JPS5545223 U JP S5545223U
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP12695978U
Other languages
Japanese (ja)
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP12695978U priority Critical patent/JPS5545223U/ja
Publication of JPS5545223U publication Critical patent/JPS5545223U/ja
Pending legal-status Critical Current

Links

JP12695978U 1978-09-18 1978-09-18 Pending JPS5545223U (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP12695978U JPS5545223U (de) 1978-09-18 1978-09-18

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP12695978U JPS5545223U (de) 1978-09-18 1978-09-18

Publications (1)

Publication Number Publication Date
JPS5545223U true JPS5545223U (de) 1980-03-25

Family

ID=29089284

Family Applications (1)

Application Number Title Priority Date Filing Date
JP12695978U Pending JPS5545223U (de) 1978-09-18 1978-09-18

Country Status (1)

Country Link
JP (1) JPS5545223U (de)

Cited By (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6066826A (ja) * 1983-09-22 1985-04-17 Matsushita Electronics Corp 半導体素子の製造方法
JP2001203201A (ja) * 1999-11-01 2001-07-27 Applied Materials Inc Hdp−cvdを適用したバリヤ層の堆積

Cited By (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS6066826A (ja) * 1983-09-22 1985-04-17 Matsushita Electronics Corp 半導体素子の製造方法
JP2001203201A (ja) * 1999-11-01 2001-07-27 Applied Materials Inc Hdp−cvdを適用したバリヤ層の堆積
JP4659202B2 (ja) * 1999-11-01 2011-03-30 アプライド マテリアルズ インコーポレイテッド バリヤ層を堆積する方法

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