JPS5540662B2 - - Google Patents

Info

Publication number
JPS5540662B2
JPS5540662B2 JP15499576A JP15499576A JPS5540662B2 JP S5540662 B2 JPS5540662 B2 JP S5540662B2 JP 15499576 A JP15499576 A JP 15499576A JP 15499576 A JP15499576 A JP 15499576A JP S5540662 B2 JPS5540662 B2 JP S5540662B2
Authority
JP
Japan
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP15499576A
Other languages
Japanese (ja)
Other versions
JPS5379776A (en
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP15499576A priority Critical patent/JPS5379776A/en
Publication of JPS5379776A publication Critical patent/JPS5379776A/en
Publication of JPS5540662B2 publication Critical patent/JPS5540662B2/ja
Granted legal-status Critical Current

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C23COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23CCOATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
    • C23C14/00Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
    • C23C14/22Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
    • C23C14/34Sputtering
    • C23C14/3471Introduction of auxiliary energy into the plasma
    • C23C14/3478Introduction of auxiliary energy into the plasma using electrons, e.g. triode sputtering
JP15499576A 1976-12-24 1976-12-24 Sputtering apparatus Granted JPS5379776A (en)

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP15499576A JPS5379776A (en) 1976-12-24 1976-12-24 Sputtering apparatus

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP15499576A JPS5379776A (en) 1976-12-24 1976-12-24 Sputtering apparatus

Publications (2)

Publication Number Publication Date
JPS5379776A JPS5379776A (en) 1978-07-14
JPS5540662B2 true JPS5540662B2 (en) 1980-10-20

Family

ID=15596398

Family Applications (1)

Application Number Title Priority Date Filing Date
JP15499576A Granted JPS5379776A (en) 1976-12-24 1976-12-24 Sputtering apparatus

Country Status (1)

Country Link
JP (1) JPS5379776A (en)

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS59123768A (en) * 1982-12-28 1984-07-17 Toyota Central Res & Dev Lab Inc Method and device for simultaneous multi-element sputtering
JP2507813Y2 (en) * 1991-08-23 1996-08-21 株式会社福岡製作所 Bicycle parking equipment for wheelchairs

Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4838076A (en) * 1971-09-10 1973-06-05
JPS5023382A (en) * 1973-07-05 1975-03-13
JPS5186083A (en) * 1974-12-16 1976-07-28 Airco Inc

Patent Citations (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPS4838076A (en) * 1971-09-10 1973-06-05
JPS5023382A (en) * 1973-07-05 1975-03-13
JPS5186083A (en) * 1974-12-16 1976-07-28 Airco Inc

Also Published As

Publication number Publication date
JPS5379776A (en) 1978-07-14

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