JPS5536709B2 - - Google Patents
Info
- Publication number
- JPS5536709B2 JPS5536709B2 JP10376477A JP10376477A JPS5536709B2 JP S5536709 B2 JPS5536709 B2 JP S5536709B2 JP 10376477 A JP10376477 A JP 10376477A JP 10376477 A JP10376477 A JP 10376477A JP S5536709 B2 JPS5536709 B2 JP S5536709B2
- Authority
- JP
- Japan
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired
Links
Classifications
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/20—Electrodes characterised by their shapes, relative sizes or dispositions
-
- C—CHEMISTRY; METALLURGY
- C25—ELECTROLYTIC OR ELECTROPHORETIC PROCESSES; APPARATUS THEREFOR
- C25F—PROCESSES FOR THE ELECTROLYTIC REMOVAL OF MATERIALS FROM OBJECTS; APPARATUS THEREFOR
- C25F3/00—Electrolytic etching or polishing
- C25F3/02—Etching
- C25F3/14—Etching locally
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10D—INORGANIC ELECTRIC SEMICONDUCTOR DEVICES
- H10D64/00—Electrodes of devices having potential barriers
- H10D64/01—Manufacture or treatment
- H10D64/011—Manufacture or treatment of electrodes ohmically coupled to a semiconductor
-
- H—ELECTRICITY
- H10—SEMICONDUCTOR DEVICES; ELECTRIC SOLID-STATE DEVICES NOT OTHERWISE PROVIDED FOR
- H10W—GENERIC PACKAGES, INTERCONNECTIONS, CONNECTORS OR OTHER CONSTRUCTIONAL DETAILS OF DEVICES COVERED BY CLASS H10
- H10W20/00—Interconnections in chips, wafers or substrates
- H10W20/01—Manufacture or treatment
- H10W20/031—Manufacture or treatment of conductive parts of the interconnections
- H10W20/063—Manufacture or treatment of conductive parts of the interconnections by forming conductive members before forming protective insulating material
Landscapes
- Chemical & Material Sciences (AREA)
- Engineering & Computer Science (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Electrochemistry (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- Weting (AREA)
- ing And Chemical Polishing (AREA)
- Manufacturing Of Printed Circuit Boards (AREA)
- Electrodes Of Semiconductors (AREA)
- Chemically Coating (AREA)
Applications Claiming Priority (1)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| NL7609816A NL7609816A (nl) | 1976-09-03 | 1976-09-03 | Werkwijze voor het vervaardigen van een lichaam voorzien met een goudpatroon en lichaam ver- vaardigd volgens de werkwijze. |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| JPS5331537A JPS5331537A (en) | 1978-03-24 |
| JPS5536709B2 true JPS5536709B2 (en:Method) | 1980-09-22 |
Family
ID=19826844
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| JP10376477A Granted JPS5331537A (en) | 1976-09-03 | 1977-08-31 | Products having metallic patterns and method of obtaining same |
Country Status (8)
| Country | Link |
|---|---|
| US (1) | US4131525A (en:Method) |
| JP (1) | JPS5331537A (en:Method) |
| CA (1) | CA1094502A (en:Method) |
| DE (1) | DE2739727C3 (en:Method) |
| FR (1) | FR2363886A1 (en:Method) |
| GB (1) | GB1531648A (en:Method) |
| IT (1) | IT1087352B (en:Method) |
| NL (1) | NL7609816A (en:Method) |
Families Citing this family (2)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JPS5327328Y2 (en:Method) * | 1973-02-20 | 1978-07-11 | ||
| US4454014A (en) * | 1980-12-03 | 1984-06-12 | Memorex Corporation | Etched article |
Family Cites Families (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| BE636943A (en:Method) * | 1962-09-18 | |||
| FR1380991A (fr) * | 1963-01-29 | 1964-12-04 | Rca Corp | Procédé de fabrication de dispositifs semi-conducteurs |
| US3325384A (en) * | 1963-11-13 | 1967-06-13 | Buckbee Mears Co | Shaped cathode for electrolytic etching |
| US3418226A (en) * | 1965-05-18 | 1968-12-24 | Ibm | Method of electrolytically etching a semiconductor having a single impurity gradient |
| US3560358A (en) * | 1968-09-12 | 1971-02-02 | Motorola Inc | Electrolytic etching of platinum for metallization |
| US3798141A (en) * | 1972-10-19 | 1974-03-19 | Bell Telephone Labor Inc | Technique for electroetching thin film metallization |
| JPS4985966A (en:Method) * | 1972-12-22 | 1974-08-17 |
-
1976
- 1976-09-03 NL NL7609816A patent/NL7609816A/xx not_active Application Discontinuation
-
1977
- 1977-08-29 CA CA285,709A patent/CA1094502A/en not_active Expired
- 1977-08-29 US US05/828,480 patent/US4131525A/en not_active Expired - Lifetime
- 1977-08-31 GB GB36334/77A patent/GB1531648A/en not_active Expired
- 1977-08-31 IT IT27126/77A patent/IT1087352B/it active
- 1977-08-31 JP JP10376477A patent/JPS5331537A/ja active Granted
- 1977-09-01 FR FR7726548A patent/FR2363886A1/fr active Granted
- 1977-09-03 DE DE2739727A patent/DE2739727C3/de not_active Expired
Also Published As
| Publication number | Publication date |
|---|---|
| IT1087352B (it) | 1985-06-04 |
| NL7609816A (nl) | 1978-03-07 |
| DE2739727B2 (de) | 1980-12-04 |
| FR2363886A1 (fr) | 1978-03-31 |
| FR2363886B1 (en:Method) | 1982-03-26 |
| DE2739727A1 (de) | 1978-03-16 |
| CA1094502A (en) | 1981-01-27 |
| JPS5331537A (en) | 1978-03-24 |
| US4131525A (en) | 1978-12-26 |
| GB1531648A (en) | 1978-11-08 |
| DE2739727C3 (de) | 1982-01-07 |